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Post-lithography pattern modification and its application to a tunable wire grid polarizer

机译:光刻后图案修改及其在可调线栅偏振器中的应用

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摘要

This study reports a simple and cost-effective post-lithography solution for reducing the characteristic dimensions of structures on the nanometer scale using an external mechanical force without any modification of the existing exposure system. In particular, this study presents a tunable aluminum wire grid polarizer (WGP) made by a laser interference lithography and i-line (365 nm) exposure setup on polyethylene naphthalate. The WGP achieves a 58% maximum linewidth shrinkage of the metal nanowire on the polymer substrate, and further improved the polarization extinction ratio by 83% with a defined operation window and optimized strain. The simulations in this study prove the rise of the extinction ratio with the modulation of the WGP pattern. Physical evidence explains the fall of the extinction ratio for both the increase of the metal crack volume and the delaminated randomly oriented fall-on fragments under extensive operation.
机译:这项研究报告了一种简单且经济高效的光刻后解决方案,该解决方案利用外部机械力在不对现有曝光系统进行任何修改的情况下,就纳米尺度上的结构减小了特征尺寸。特别是,这项研究提出了一种可调谐铝线栅偏振器(WGP),该偏振器是通过激光干涉光刻和i-line(365 nm)曝光设置在聚萘二甲酸乙二醇酯上制成的。 WGP实现了金属纳米线在聚合物基板上的最大线宽收缩58%,并在定义的操作窗口和最佳应变的情况下将偏振消光比进一步提高了83%。本研究中的仿真证明了灭绝比随WGP模式的调制而增加。物理证据解释了在大范围操作下,金属裂纹体积的增加和分层的随机取向的掉落碎片的消光率下降。

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