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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Interface characterization and atomic intermixing processes in Be/W bilayers deposited on Si(0 01) substrates with Fe buffer layers
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Interface characterization and atomic intermixing processes in Be/W bilayers deposited on Si(0 01) substrates with Fe buffer layers

机译：沉积在具有Fe缓冲层的Si（0 01）衬底上的Be / W双层中的界面表征和原子混合过程

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摘要

Structural aspects and atomic intermixing processes in Be/W bilayers deposited on Si(0 01) substrates with Fe buffer layers enriched in the ~(57)Fe Mossbauer isotope have been studied via atomic force microscopy, grazing incidence X-ray diffractometry, X-ray refiectometry, X-ray photoelectron spectroscopy and conversion electron Mossbauer spectroscopy. The mentioned investigations allowed a full sequential characterization of the involved interfaces. Various ionic configurations appeared for Fe or W, while an amorphous state was observed in the case of Be. It has been proven that the Be layer has a negative influence on the roughness of the whole structure, which however presents an oxidation gradient from more oxidized elements at the surface towards more reduced elements in deeper layers. A strong diffusion of the W atoms inside the Be layer, induced by the deposition method, as well as of the Fe atoms inside the Be layer, induced by thermal annealing, has been evidenced.
机译：通过原子力显微镜，掠入射X射线衍射法，X-射线法研究了沉积在具有丰富的〜（57）Fe Mossbauer同位素的Fe缓冲层的Si（0 01）衬底上的Be / W双层中Be / W双层的结构特征和原子混合过程。射线反射光度法，X射线光电子能谱和转换电子Mossbauer光谱。提到的调查可以对所涉及的接口进行完整的顺序表征。 Fe或W出现各种离子构型，而Be则观察到非晶态。已经证明，Be层对整个结构的粗糙度具有负面影响，然而，Be层呈现出从表面上的更多氧化元素向更深层中的更多还原元素的氧化梯度。已经证明了由沉积方法引起的Be层内部的W原子的强烈扩散以及由热退火引起的Be层内部的Fe原子的强扩散。

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