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Effective metrology and standard of the surface roughness of micro/nanoscale waveguides with confocal laser scanning microscopy

机译：微/纳米波导与共聚焦激光扫描显微镜的有效计量和标准的微/纳米波导的粗糙度

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摘要

Surface roughness is one of the important parameters affecting the optical scattering loss of dielectric waveguides. Despite extensive research interests in correlating optical losses with surface roughness, not much research focus has been dedicated to the study of an accurate metrology and measurement standard for the characterization of waveguide roughness. In this Letter, we report an effective metrology for the measurement of waveguide surface roughness, using confocal laser scanning microscopy (CLSM). We also provide the definition of surface roughness relevant to CLSM terminology based on the measured peak-to-valley (P-V) values, which can be correlated to the conventional root-mean-square roughness, by employing multi-dimensional statistical models. Finally, we demonstrate the use of CLSM metrology in measuring two-dimensional roughness of 10 mu m x 6 mu m silica waveguides, showing an average top surface roughness of 0.151 mu m and an average sidewall roughness of 0.203 mu m. For comparison, the scanning electron microscopy (SEM) measurements are also carried out for the same waveguide samples, and then the measured sidewall roughness values are in the range of 0.08-0.12 mu m. Since SEM measures only the amplitude of roughness profile, while CLSM measures the P-V value, after doubling the SEM value, these two methods can provide comparable results of roughness. (C) 2019 Optical Society of America
机译：表面粗糙度是影响电介质波导的光散射损耗的重要参数之一。尽管具有广泛的研究兴趣与表面粗糙度相关的光学损失，但研究重点不是很多，致力于研究准确的计量和测量标准，以表征波导粗糙度。在这封信中，我们使用共聚焦激光扫描显微镜（CLSM）报告了用于测量波导表面粗糙度的有效计量。我们还基于测量的峰 - 谷（P-V）值，提供与CLSM术语相关的表面粗糙度的定义，其可以通过采用多维统计模型与传统的根均方粗糙度相关。最后，我们证明了在测量10μm×6μm的二维粗糙度时使用CLSM计量，显示为0.151μm的平均顶面粗糙度和0.203μm的平均侧壁粗糙度。为了比较，还对相同的波导样品进行扫描电子显微镜（SEM）测量，然后测量的侧壁粗糙度值在0.08-0.12μm的范围内。由于SEM仅测量粗糙度曲线的幅度，而CLSM测量P-V值，则在SEM值加倍后，这两种方法可以提供粗糙度的可比结果。 （c）2019年光学学会

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