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首页> 外文期刊>Crystal Research and Technology: Journal of Experimental and Industrial Crystallography >Optimization of Cr8O21 targets for pulsed laser deposition
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Optimization of Cr8O21 targets for pulsed laser deposition

机译：Cr8O21脉冲激光沉积靶的优化

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摘要

This work describes the preparation of Cr8O21 Pellets with optimised mass density to be used as targets for Pulsed Laser Deposition (PLD) of chromium dioxide thin films. Cr8O21 is synthesised by thermal decomposition of CrO3, at 270 degrees C. An attempt to reduce the grain size of the Cr8O21 powder to the nanometer scale has been made in order to increase the density of the pressed and sintered pellets serving as targets. The morphology of those starting fine powders as well as of targets (before and after laser ablation) and the corresponding thin films were characterized and studied using X-ray diffraction (XRD), Scanning Electron Microscopy (SEM) and Raman spectroscopy. The composition of the films is a mixture of crystallised Cr2O3 and amorphous CrO2. (c) 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
机译：这项工作描述了具有最佳质量密度的Cr8O21球粒的制备，该颗粒将用作二氧化铬薄膜的脉冲激光沉积（PLD）的目标。 Cr8O21是在270摄氏度下通过热分解CrO3合成的。为了增加用作目标的压制和烧结颗粒的密度，已尝试将Cr8O21粉末的晶粒尺寸减小至纳米级。使用X射线衍射（XRD），扫描电子显微镜（SEM）和拉曼光谱法表征和研究了这些起始细粉以及靶材（在激光烧蚀之前和之后）和相应薄膜的形态。膜的组成是结晶的Cr2O3和无定形的CrO2的混合物。 （c）2005 WILEY-VCH Verlag GmbH＆Co. KGaA，Weinheim。

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