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首页> 外文期刊>ACS applied materials & interfaces >Cell-Imprint Surface Modification by Contact Photolithography-Based Approaches: Direct-Cell Photolithography and Optical Soft Lithography Using PDMS Cell Imprints
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Cell-Imprint Surface Modification by Contact Photolithography-Based Approaches: Direct-Cell Photolithography and Optical Soft Lithography Using PDMS Cell Imprints

机译：通过触点基于光刻的方法改变细胞压缩表面改性：使用PDMS细胞印记直接电池光刻和光学软光刻

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摘要

New cell-imprint surface modification techniques based on direct-cell photolithography and optical soft lithography using poly(dimethylsiloxane) (PDMS) cell imprints are presented for enhanced cell-based studies. The core concept of engineering materials for cell-based studies is the material's ability to redesign the physicochemical characteristics of the cellular niche. There is a growing interest in direct molding from cells (cell imprinting). These negative copies of cell surface topographies have been shown to affect cell shape and direct mesenchymal stem cells' differentiation. Analyzing the results is however challenging as cells seeded on these substrates do not always end up in a cell pattern, which leads to decreased effectiveness and biased quantification. To gain control over cell seeding into the patterns and avoid unwanted cell population outside the cell-imprinted surface needs to be modified. From this perspective, the standard optical contact lithography process was modified and cells were introduced to the cleanroom. Direct-cell photolithography was used for a single-step PDMS cell-imprint (chondrocytes as the molding template) surface modification down to single-cell (approximately 5 mu m in diameter) resolution. As cells come in a variety of shapes, sizes, and optical profiles, a complementary optical soft lithography-based photomask fabrication technique is also reported. The simplicity of the fabrication process makes this cell-imprint surface modification technique compatible with any adherent cell type and leads to efficient cell-based studies.
机译：介绍了使用聚（二甲基硅氧烷）（PDMS）细胞印记的基于直接电池光刻和光学软光刻的新的细胞 - 压印表面改性技术，用于增强基于细胞的研究。基于细胞的研究的工程材料的核心概念是重新设计细胞利基的物理化学特征的材料。对来自细胞的直接模塑（细胞印迹）越来越感兴趣。已经显示出细胞表面拓扑的这些负拷贝影响细胞形状和直接间充质干细胞的分化。然而，随着在这些基材上的细胞播种的细胞并不总是以细胞模式最终结束，这导致有效性降低和偏置量化的细胞并不总是挑战。为了控制细胞播种进入图案并避免需要修改细胞印迹表面外的不需要的细胞群。从这种角度来看，改性标准光学触点光刻工艺，并将细胞引入洁净室。将直接电池光刻法用于单步PDMS细胞印记（作为模塑模板的软骨细胞）表面改性到单电池（直径约为5μm）分辨率。随着细胞以各种形状，尺寸和光学配置，还报道了一种互补的光学软光刻的光掩模制造技术。制造过程的简单性使得这种细胞压印表面改性技术与任何粘附细胞类型相容并导致有效的基于细胞的研究。

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