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Mid-infrared photoluminescence of InAsN dilute nitride alloys grown by LPE and MBE

机译:LPE和MBE生长的InAsN稀氮化合金的中红外光致发光

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摘要

Dilute nitride InAsN epitaxial layers were produced using both liquid phase and molecular beam epitaxial growth techniques. The spectral features in the photoluminescence of samples containing up to 1% N with emission energies in the mid-infrared spectral region are described and compared. The emission intensities of both LPE and MBE grown materials were found to be comparable. Increasing the N content in the InAsN alloys resulted in a significant increase in the activation energy for thermal quenching of the photoluminescence emission due to a combination of lowering of the conduction band edge and Auger de-tuning.
机译:使用液相和分子束外延生长技术生产稀氮化物InAsN外延层。描述和比较了含N高达1%的样品的光致发光光谱特征,并在中红外光谱区域中进行了发射。发现LPE和MBE生长材料的发射强度是可比的。 InAsN合金中N含量的增加导致光导发光猝灭的活化能显着增加,这是由于导带边缘的降低和俄歇失谐引起的。

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