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RIMS (real-time imprint monitoring by scattering of light) study of pressure, temperature and resist effects on nanoimprint lithography

机译：RIMS（通过光散射进行实时压印监控）研究压力，温度和抗蚀剂对纳米压印光刻的影响

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摘要

To optimize nanoimprint lithography (NIL), it is essential to be able to characterize and control the NIL process in situ and in real time. Recently we have developed a real-time imprint monitoring by the scattering-of-light (RIMS) approach, which allows us to detect the degree of resist deformation and the duration of resist penetration by a mould during the imprint process in real time. In this paper we report the performances of RIMS under a broad range of working conditions. RIMS data shows that the resist penetration is facilitated by increasing processing temperature, pressure and the resist film thickness; a prolonged pre-NIL resist baking step, on the other hand, has the effect of slowing it down. Our results provide further demonstration of the effectiveness of this method under different working conditions. RIMS measurements show not only how long an imprint takes to complete, but also how an imprint progresses with time and how it is affected by differences in processing parameters. These measurements provide information crucial for a better understanding and process optimization in NIL.
机译：为了优化纳米压印光刻（NIL），至关重要的是能够原位实时地表征和控制NIL工艺。最近，我们开发了一种通过光散射（RIMS）方法进行实时压印监控的方法，该方法使我们能够实时检测压印过程中抗蚀剂变形的程度以及模具中抗蚀剂渗透的持续时间。在本文中，我们报告了RIMS在广泛的工作条件下的性能。 RIMS数据表明，通过增加加工温度，压力和抗蚀剂膜厚度可以促进抗蚀剂的渗透。另一方面，长时间的NIL抗蚀剂预烘烤步骤会减慢其速度。我们的结果进一步证明了该方法在不同工作条件下的有效性。 RIMS测量不仅显示烙印完成需要多长时间，而且还显示烙印随时间变化的过程以及其受处理参数差异的影响。这些测量提供了对于更好地理解NIL和优化过程至关重要的信息。

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