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Impact of mold geometries and imprinted resist thickness on velocity fields for nanoimprint lithography

机译：模具几何形状的影响和压印抗蚀剂厚度对纳米压印光刻的速度场

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Nanoimprint lithography (NIL) is a potential and novel technology for the fabrication of nanpmeter scale patterns with low cost, high througput, and high resolution. A deep understanding of polymer flow during NIL will contribute to the improvement of the NIL process. However, a few studies investigated the filling behavior of NIL that treated polymers as either an elastic solid material [1] or a viscous Newtonian fluid [2,3] in simulations. Moreover, for the velocity fields of filled polymer are often ignored and are rarely found in literatures. In this paper the study of the velocity fields, including the lateral and vertical velocity, is significant because the velocity field can directly describe the mode of the polymer deformation, which is the key role to determine the mechanism of nanoimprint forming.
机译：Nanoimprint光刻（NIL）是一种潜在和新技术，用于制造具有低成本，高跟序和高分辨率的低成本，高的高度。在NIL期间对聚合物流动的深入了解将有助于改善零过程。然而，一些研究研究了含量的NIL的填充行为，所述聚合物作为弹性固体材料[1]或粘性牛顿流体[2,3]在模拟中。此外，对于填充聚合物的速度场通常被忽略并且很少在文献中发现。本文在包括横向和垂直速度的速度场的研究是显着的，因为速度场可以直接描述聚合物变形的模式，这是确定纳米压印成形机制的关键作用。

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