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Nanoimprint resist, nanoimprint mold and nanoimprint lithography
Nanoimprint resist, nanoimprint mold and nanoimprint lithography
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机译：纳米压印抗蚀剂，纳米压印模具和纳米压印光刻
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摘要
A nanoimprint lithography method includes the following steps. First, a first sacrifice layer, a second sacrifice layer and a nanoimprint resist are formed on a substrate. The nanoimprint resist includes a hyperbranched polyurethane oligomer, a perfluoropolyether; a methylmethacrylate, and a diluent solvent. Second, a master stamp with a first nanopattern formed by a number of projecting portions and gaps is provided, and the first nanopattern is pressed into the nanoimprint resist to form a second nanopattern in the nanoimprint resist. Third, the second nanopattern is transferred to the substrate.
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