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首页> 外文期刊>Materials Science Research International >Quantitative evaluation of pinhole defects in TiN films prepared by R.F. reactive sputtering
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Quantitative evaluation of pinhole defects in TiN films prepared by R.F. reactive sputtering

机译：R.F.制备的TiN膜中针孔缺陷的定量评估反应溅射

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Pinhole defects of TIN-coated stainless steels were evaluated potentiodynamically in a deaerated 0.5kmol/m{sup}3 H{sub}2SO{sub}4+0.05kmol/m{sup}3 KSCN solution at 298K. The TIN films prepared by radio frequency (r.f.) reactive sputtering exhibited the columnar structure with the preferential <220> or <111> orientation, and they contained more or less pinhole defects. The critical passivation current density i{sub}(crit) in the TiN-coated specimens decreased considerably with increasing film thickness. Above 1.5μm in thickness, however, there was an increasing tendency in i{sub}(crit) with cracking and/or peeling. The area ratio of pinhole defects was evaluated by the ratio of i{sub}(crit) of a coated and a non-coated specimen. The result coincided comparatively well with the true defect area ratio based on the optical micrographs before and after anodically polarized. Such electrochemical method was concluded to be a reliable evaluation technique for the pinhole defects of corrosion-resistive coating.
机译：在298K的脱气0.5kmol / m {sup} 3 H {sub} 2SO {sub} 4 + 0.05kmol / m {sup} 3 KSCN溶液中，用电位动力学方法评估了TIN涂层TIN的针孔缺陷。通过射频（r.f.）反应溅射制备的TIN膜表现出具有优先<220>或<111>取向的柱状结构，并且它们或多或少地包含针孔缺陷。 TiN涂层样品的临界钝化电流密度i {sub}（crit）随着膜厚的增加而显着降低。然而，厚度超过1.5μm时，裂纹和/或剥离会增加i {sub}（crit）的趋势。针孔缺陷的面积比通过涂覆样品和未涂覆样品的i {sub}（临界）之比进行评估。根据阳极极化前后的光学显微照片，结果与真实的缺陷面积比相当吻合。结论是，这种电化学方法是对耐腐蚀涂层的针孔缺陷的可靠评估技术。

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