...
首页> 外文期刊>Philosophical Magazine Letters >Role of cross-slipping in formation of edge dislocations in heteroepitaxial systems GeSi-on-Si(001) and Ge-on-InGaAs/GaAs
【24h】

Role of cross-slipping in formation of edge dislocations in heteroepitaxial systems GeSi-on-Si(001) and Ge-on-InGaAs/GaAs

机译:交叉滑移在异质外延体系GeSi-on-Si(001)和Ge-on-InGaAs / GaAs中边缘位错形成中的作用

获取原文
获取原文并翻译 | 示例
           

摘要

Edge misfit dislocations (MDs) formed as result of reactions between 60° glissile threading dislocations and 60° MDs lying on an intersecting glide plane were found in strained GeSi-on-Si(OOl) and Ge-on-InGaAs/GaAs films. It was demonstrated that dislocations penetrating from the InGaAs buffer layer to the strained Ge film can provoke formation of not only 60° MDs, but also edge MDs on the interface even at minor mismatch of the lattice parameters of the film and the InGaAs/GaAs virtual substrate.
机译:在应变的GeSi-on-Si(OOl)和Ge-on-InGaAs / GaAs薄膜中发现了由于60°易弯曲螺纹位错与位于相交滑行平面上的60°MD之间的反应而形成的边缘失配位错(MDs)。结果表明,从InGaAs缓冲层到应变Ge膜的位错渗透不仅会引起60°MD的形成,而且还会引起界面上的边缘MD的形成,即使膜的晶格参数与InGaAs / GaAs虚构的配比很小。基质。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号