首页> 外文期刊>Philosophical magazine, B. Physics of condensed matter, electronic, optical, and magnetic properties >Thermal modification of wide-bandgap hydrogenated amorphous silicon-carbon alloy films grown by plasma-enhanced chemical vapour deposition from C2H2+SiH4 mixtures
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Thermal modification of wide-bandgap hydrogenated amorphous silicon-carbon alloy films grown by plasma-enhanced chemical vapour deposition from C2H2+SiH4 mixtures

机译:通过等离子体增强化学气相沉积法从C2H2 + SiH4混合物中生长的宽带隙氢化非晶硅碳合金薄膜的热改性

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摘要

The thermal stability of hydrogenated amorphous silicon-carbon (aSi(1-x)C(x):H) alloy films grown by plasma-enhanced chemical vapour deposition from C2H2+SiH4 mixtures was characterized by means of infrared spectroscopy, electron spin resonance, transmittance-reflectance spectroscopy and photoluminescence (PL) spectroscopy. It is demonstrated that the network undergoes relaxation and reconstruction under the condition of low-temperature annealing. Weak C-C, Si-Si and C-Si bonds will be broken, and a new stage of hydrogen effusion and structural rearrangement will occur under the condition of high-temperature annealing. The thermal stability a-Si1-xCx:H of films increases with increase in carbon content. In carbon-poor a-Si1-xCx:H networks, the dangling bonds are the main non-radiative recombination channel, which causes a strong correlation of the PL signal with defect density. In carbon-rich a-Si1-xCx:H networks, pi-bonded clusters play an important role in the luminescence process. The PL intensity has little dependence on defects in carbon-rich a-Si1-xCx:H.
机译:通过红外光谱法,电子自旋共振,电子自旋共振,热定性等方法表征了通过等离子体增强化学气相沉积从C2H2 + SiH4混合物中生长的氢化非晶硅碳(aSi(1-x)C(x):H)合金膜的热稳定性透射-反射光谱和光致发光(PL)光谱。结果表明,在低温退火条件下,网络经历了弛豫和重构。弱的C-C,Si-Si和C-Si键将被破坏,并且在高温退火的条件下将发生新的氢渗出和结构重排的阶段。膜的热稳定性a-Si1-xCx:H随着碳含量的增加而增加。在贫碳的a-Si1-xCx:H网络中,悬空键是主要的非辐射复合通道,这导致PL信号与缺陷密度密切相关。在富含碳的a-Si1-xCx:H网络中,π键簇在发光过程中起着重要作用。 PL强度对富碳a-Si1-xCx:H中的缺陷几乎没有依赖性。

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