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A method for the production of selectively thin layers for micromechanical components by means of atomic layers deposition
A method for the production of selectively thin layers for micromechanical components by means of atomic layers deposition
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机译：通过原子层沉积生产用于微机械部件的选择性薄层的方法
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摘要
The present invention provides a process for the production of thin layers selectively for micromechanical components by means of atomic layers deposition. For this purpose, a substrate with a front side and a back side is provided. The substrate is heated locally in such a way that at least one heated region with a first temperature is formed. In a next step, at least one atom layers deposition - reaction cycle is carried out, during the at least one atom layers deposition - reaction cycle at least two reactants are used and a thin layer on the at least one heated region is formed.
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