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首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures >Transport behavior of atomic layer deposition precursors through polymer masking layers: Influence on area selective atomic layer deposition
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Transport behavior of atomic layer deposition precursors through polymer masking layers: Influence on area selective atomic layer deposition

机译：原子层沉积前体通过聚合物掩膜层的传输行为：对区域选择性原子层沉积的影响

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摘要

Sorption and diffusion of precursors through polymer layers were considered as limitations to the successful implementation of a polymer film-based masking approach to area selective atomic layer deposition techniques (ASALDT). Quartz crystal microbalance studies were used to estimate solubility and diffusivity of ALD precursors through supported thin polymer films at elevated temperatures. Specifically, measurements have been performed to estimate the solubility of water in polyhydroxystyrene, polymethylmethacrylate (PMMA), and hexafluoroisopropylalcohol polynorbornene. In addition, diffusion coefficients and solubilities of titanium tetrachloride (TiCl_4) and titanium isopropoxide [Ti(ipr)_4] through PMMA have also been determined. The results suggest that polymer films exhibit insignificant water uptake at high temperature (～160℃) and, hence, sorption of water into polymer films does not pose limitations to polymer masking-based ASALDT. Diffusion coefficient measurements of metal precursors account for the role of precursor size in determining the minimum polymer masking layer thickness for a successful ASALDT process.
机译：前体通过聚合物层的吸附和扩散被认为是成功实施基于聚合物膜的掩膜方法的区域选择性原子层沉积技术（ASALDT）的限制。石英晶体微天平研究被用于评估在高温下通过负载的聚合物薄膜形成的ALD前体的溶解度和扩散率。具体而言，已经进行了测量以估计水在聚羟基苯乙烯，聚甲基丙烯酸甲酯（PMMA）和六氟异丙醇聚降冰片烯中的溶解度。此外，还确定了四氯化钛（TiCl_4）和异丙醇钛[Ti（ipr）_4]通过PMMA的扩散系数和溶解度。结果表明，聚合物膜在高温（〜160℃）下的吸水率不高，因此水对聚合物膜的吸附不会对基于聚合物掩膜的ASALDT构成限制。金属前体的扩散系数测量结果说明了前体尺寸在确定成功的ASALDT工艺的最小聚合物掩膜层厚度中的作用。

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