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Generalization of the Photo Process Window and Its Application to Opc Test Pattern Design
Generalization of the Photo Process Window and Its Application to Opc Test Pattern Design
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机译：照片处理窗口的一般化及其在Opc测试图案设计中的应用
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摘要
A method comprises the steps of: (a) simulating on a processor a fabrication of a plurality of layout patterns by a lithographic process; (b) determining sensitivities of the layout patterns to a plurality of parameters based on the simulation; (c) using the sensitivities to calculate deviations of the patterns across a range of each respective one of the parameters; and (d) selecting ones of the patterns having maximum or near-maximum deviations to be used as test patterns.
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