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METHOD FOR CORRECTING DEFECT IN GRAY TONE MASK, METHOD FOR MANUFACTURING GRAY TONE MASK, GRAY TONE MASK, AND METHOD FOR TRANSFERRING PATTERN

机译：校正灰色色调面膜中的缺陷的方法，制造灰色色调面膜，灰色色调面膜的方法以及转移图案的方法

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摘要

PPROBLEM TO BE SOLVED: To provide a method for correcting a defect in a gray tone mask, by which a defect caused in a semi-translucent part can be suitably corrected. PSOLUTION: The method for correcting the defect in a gray tone mask 20 having a light-shielding part 21, a translucent part 22 and a semi-translucent part 23 where the transmission amount of exposure light to be used when using the mask can be decreased by a predetermined amount, includes: a step in which the semi-translucent part 23 is formed of a semi-translucent film 26 and a defective region is specified in the semi-translucent part 23; and a step of forming a correction film 27 having a different composition from that of the semi-translucent film in the defective region. In the step of forming a correction film, light transmittance characteristics of the correction film with respect to the exposure light at a predetermined wavelength are preliminarily recognized; and on the basis of the recognized light transmittance characteristics of the correction film, such conditions are applied that the light transmittance of the correction film 27 with respect to the exposure light at the predetermined wavelength is approximately equal to that of the semi-translucent film 26. PCOPYRIGHT: (C)2009,JPO&INPIT

机译：

要解决的问题：提供一种用于校正灰色色调掩模中的缺陷的方法，通过该方法可以适当地校正在半透明部分中引起的缺陷。

解决方案：校正具有光屏蔽部分21，半透明部分22和半透明部分23的灰度色调掩模20中的缺陷的方法，其中使用该掩模时要使用的曝光光的透射量可以减少预定量的步骤，包括：由半透明膜26形成半透明部分23并且在半透明部分23中指定缺陷区域的步骤;在缺陷区域中形成与半透明膜的组成不同的校正膜27的步骤。在形成校正膜的步骤中，预先识别出校正膜相对于预定波长的曝光光的透光率特性。并且，根据识别的校正膜的透光率特性，以校正膜27相对于规定波长的曝光光的透光率大致等于半透明膜26的透光率的条件为条件。

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公开/公告号JP2009020312A

专利类型
公开/公告日2009-01-29

原文格式PDF
申请/专利权人 HOYA CORP;
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申请/专利号JP20070182870
发明设计人 TANAKA JUNICHI;SANO MICHIAKI;
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申请日2007-07-12
分类号G03F1/08;
国家 JP
入库时间 2022-08-21 19:41:19

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