首页> 外文会议>18th Symposium on Microelectronics Technology and Devices; 16th Symposium on Integrated Circuits and System Design; Sep 8-11, 2003; Sao Paulo, Brazil >A STUDY ON THE SELF-HEATING EFFECT IN DEEP-SUBMICROMETER PARTIALLY DEPLETED SOI MOSFETS AT LOW TEMPERATURES
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A STUDY ON THE SELF-HEATING EFFECT IN DEEP-SUBMICROMETER PARTIALLY DEPLETED SOI MOSFETS AT LOW TEMPERATURES

机译:深亚微米部分耗尽SOI MOSFET低温自热效应的研究

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This work studies the self-heating effect in deep-submicrometer partially depleted SOI nMOSFETs during low temperature operation and high gate/drain voltages. The study is carried out by looking at the influence of the halo implantation on the thermal characteristics. The halo region causes a more pronounced negative output conductance than for the transistors without a halo implantation. An estimate of the temperature rise in both types of devices is made, based on the thermal resistance, which is derived from the output characteristics in function of the temperature.
机译:这项工作研究了在低温工作和高栅极/漏极电压期间深亚微米部分耗尽的SOI nMOSFET中的自热效应。通过观察晕环注入对热特性的影响来进行研究。与没有光晕注入的晶体管相比,光晕区域会导致更明显的负输出电导。根据热阻对两种类型的设备中的温度升高进行估算,该热阻是根据温度的输出特性得出的。

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