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首页> 外文会议>Advances in Resist Technology and Processing XXIII pt.1 >Vinyl ether resist system for UV-cured nanoimprint lithography
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Vinyl ether resist system for UV-cured nanoimprint lithography

机译：用于紫外线固化纳米压印光刻的乙烯基醚抗蚀剂系统

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摘要

Cationic curing of vinyl ethers for step-and-flash nanoimprint lithography is described. Photochemical acid generators for use in the vinyl ether formulation were carefully selected on the basis of their solubility in neat lipophilic vinyl ether. Our favorite acid generators include diphenyltolylsulfonium triflate, CGI261, CGI1905, CGI1906, and CGI1907. The CGI1900 series is sensitive to i-line irradiation while the former two can be sensitized to 365 nm radiation by adding 9-anthracenemethanol. Phenothiazine is also an effective i-line sensitizer of the sulfonium salt. A major problem associated with the vinyl ether curing material is poor storage stability and the formulation rapidly solidifies at room temperature. However, it has been found that anthracenemethanol can stabilize the sulfonium salt and CGI formulations against the aging. Phenothiazine extends the shelf life of the sulfonium salt system but violently reacts with the CGI PAGs. Volatility of the vinyl ethers was measured by thermogravimetric analysis at room temperature. Photochemical curing of the formulations was investigated by FT-IR and also by differential scanning calorimetry (DSC) equipped with a UV lamp. The photo-DSC analysis was particularly useful in ascertaining the cure kinetics and the efficacy of the sensitization. Preliminary imprint experiments successfully printed 50 nm dense features.
机译：描述了用于一步和快速纳米压印光刻的乙烯基醚的阳离子固化。基于它们在纯亲脂性乙烯基醚中的溶解度，仔细选择了用于乙烯基醚制剂的光化学产酸剂。我们最喜欢的产酸剂包括三氟甲磺酸二苯基甲苯磺酸ulf，CGI261，CGI1905，CGI1906和CGI1907。 CGI1900系列对i-line辐射敏感，而前两种可以通过添加9-蒽甲醇对365 nm辐射敏感。吩噻嗪也是is盐的有效i-line敏化剂。与乙烯基醚固化材料相关的主要问题是差的储存稳定性，并且该制剂在室温下快速固化。然而，已经发现，蒽甲醇可以稳定salt盐和CGI制剂以防止老化。吩噻嗪延长了salt盐体系的货架期，但与CGI PAG剧烈反应。乙烯基醚的挥发性通过在室温下的热重分析来测量。通过FT-IR以及配备有UV灯的差示扫描量热法（DSC）研究了制剂的光化学固化。光DSC分析在确定固化动力学和敏化效果方面特别有用。初步的压印实验成功地印制了50​​ nm的密集特征。

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