首页> 外文会议>Conference on Photomask and Next-Generation Lithography Mask Technology IX, Apr 23-25, 2002, Yokohama, Japan >A novel baking technology using halogen lamps for higher precision photomask fabrication
【24h】

A novel baking technology using halogen lamps for higher precision photomask fabrication

机译:使用卤素灯的新型烘烤技术,可用于更高精度的光掩模制造

获取原文
获取原文并翻译 | 示例

摘要

Heating performances of a lamp heater system using halogen lamps were investigated. Good heating performances were obtained for both Cr and half-tone mask even though there was a concern that the heating performances varied when the material of film differed. As a result of controlling the resist temperature with quick response, the temperature uniformity was not only improved but also overshooting of the temperature was reduced. It was possible to realize a different process temperature in each area because films were heated directly, and so the reaction amount of CAR during PEB that is including cooling process of substrate could be even in each pattern area on mask. In addition, this heating method does not influence quartz thickness, so the lamp heater system has the same performance for 9-inch substrate as 6-inch substrate.
机译:研究了使用卤素灯的灯加热器系统的加热性能。尽管人们担心当膜的材料不同时加热性能会发生变化,但对于Cr和半色调掩模都获得了良好的加热性能。通过快速响应地控制抗蚀剂温度,不仅提高了温度均匀性,还减少了温度的过冲。由于可以直接加热薄膜,因此可以在每个区域实现不同的处理温度,因此在PEB期间,包括基板冷却过程在内的CAR的反应量在掩模上的每个图案区域都可以均匀。另外,这种加热方法不影响石英厚度,因此灯加热器系统在9英寸基板上具有与6英寸基板相同的性能。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号