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High-resolution optical surface topography measurements

机译:高分辨率光学表面形貌测量

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Optical methods are becoming interesting tools for high-resolution surface topography measurements. Micro- and macrostructure measurement techniques were developed to measure surface topography with resolutions of one micrometer or better. The progress made in the last few years is due to the development of the laser and solid state detector elements together with very powerful computer support for the processing of information. Methods for optical surface topography measurements based on the confocal principle and interferometry, together with future trends and some limitations, are discussed.
机译:光学方法正在成为高分辨率表面形貌测量的有趣工具。开发了微型和宏观结构测量技术以测量具有一微米或更好的分辨率的表面形貌。在过去几年中取得的进展是由于激光和固态检测器元件的开发以及非常强大的计算机支持,用于处理信息。讨论了基于共聚焦原理和干涉测量的光学表面形貌测量方法,以及未来的趋势和一些限制。

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