Influence of AlN coverlayers prepared by reactive sputtering on DyFeCo magneto-optical media

机译：反应溅射在Dyfeco磁光介质上制备的ALN覆盖层的影响

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AlN_x/DyFeCo films were deposited on glass substrates by magnetron sputtering and reactive rf magnetron sputtering. The influence of AlN_x coverlayers on DyFeCo magneto-optical media was studied. The results show that nitrogen surplus in AlN_x leads to changes in the MO behavior of DyFeCo films due to the reaction of Dy with nitrogen. Furthermore, the influence of thickness of AlN films on te coercivity, anisotropy and eigenvalue of kerr rotation angle of RE-TM films was investigated. The results can be explained based on the internal stress, impurities and the pinning of defects induced by "peening effects" of high-speed atoms.

机译：通过磁控溅射和反应性RF磁控溅射沉积ALN_X / DYFECO薄膜。研究了aln_x覆盖层对Dyfeco磁光介质的影响。结果表明，由于DY与氮气的反应，ALN_X中的氮气过剩导致Dyfeco膜的Mo行为的变化。此外，研究了RE-TM膜的克尔旋转角度对Te矫顽力，各向异性和克尔旋转角度的Te矫顽力，各向异性和特征值的影响。结果可以基于高速原子“喷丸效应”诱导的缺陷的内部应力，杂质和捕捉来解释。

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来源
《International symposium on optical storage》|2001年||共4页
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作者
Rui Xiong; Zuoyi Li; Xiaofei Yang; Deichen Tian; Jing Shi; Wufeng Tang; SPIE-The International Society for Optical Engineering;
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正文语种
中图分类光存贮器及其驱动器;
关键词
Magneto-optical films; AlN protective layers; influence;

机译：磁光薄膜;ALN保护层;影响;

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专利

1. AlN films prepared on 6H-SiC substrates under various sputtering pressures by RF reactive magnetron sputtering [J] . Xu-Ping Kuang, Hua-Yu Zhang, Gui-Gen Wang, Applied Surface Science . 2012,第期

机译：通过射频反应磁控溅射在6H-SiC衬底上以不同的溅射压力制备AlN膜
2. Influence of sputtering parameters on structures and residual stress of AlN films deposited by DC reactive magnetron sputtering at room temperature [J] . H.Y. Liu, G.S. Tang, F. Zeng, Journal of Crystal Growth . 2013,第JANa15期

机译：溅射参数对室温直流反应磁控溅射沉积AlN薄膜结构和残余应力的影响
3. Characterization of AlN thin film prepared by reactive sputtering [J] . Zang Yuan, Li Lianbi, Ren Zhanqiang, Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films . 2016,第10期

机译：反应溅射制备AlN薄膜的表征
4. Influence of AlN coverlayers prepared by reactive sputtering on DyFeCo magneto-optical media [C] . Rui Xiong, Zuoyi Li, Xiaofei Yang, International symposium on optical storage . 2001

机译：反应溅射在Dyfeco磁光介质上制备的ALN覆盖层的影响
5. Cation Doped Titanum Dioxygen Thin Films Prepared by Reactive Sputtering: Synthesis, Characterization, and Applications for Environmental Catalysis. [D] . DeSario, Paul Anthony. 2011

机译：通过反应溅射制备的阳离子掺杂钛双氧薄膜：合成，表征和在环境催化中的应用。
6. The Influence of AlN Intermediate Layer on the Structural and Chemical Properties of SiC Thin Films Produced by High-Power Impulse Magnetron Sputtering [O] . Nierlly Galvão, Marciel Guerino, Tiago Campos, 2016

机译：AlN中间层对大功率脉冲磁控溅射SiC薄膜结构和化学性能的影响
7. Mechanical Properties And Microstructure Of AlN/SiCN Nanocomposite Coatings Prepared By R.F.-Reactive Sputtering Method [O] . Nakafushi Y., Matsuda K., Nose M. 2015

机译：R.F.-反应溅射法制备alN / siCN纳米复合涂层的力学性能和微观结构

Influence of AlN coverlayers prepared by reactive sputtering on DyFeCo magneto-optical media

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