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首页> 外文会议>Conference on Micromachining Technology for Micro-Optics and Nano-Optics >Fabrication of Nano and Micro Optical Elements by Step and Flash Imprint Lithography
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Fabrication of Nano and Micro Optical Elements by Step and Flash Imprint Lithography

机译：通过步骤和微光学元件的制造和闪光印记光刻

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The Step and Flash Imprint Lithography (S-FIL™ ) process is a step and repeat nano-imprint lithography (NIL) technique based on UV curable low viscosity liquids. Investigation by this group and others has shown that the resolution of replication by imprint lithography is limited only by the size of the structures that can be created on the template (mold). S-FIL uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning. This approach allows for micro and nano-fabrication of devices with widely varying pattern densities and complicated structures. Wire grid polarizers and micro lenses are two examples for optical components that can be formed using S-FIL technology. Step and Flash Imprint Lithography Reverse (S-FIL/R) tone has been used to form resist patterns for a number of different device types. The authors have employed S-FIL/R and dry develop techniques to form resist patterns with 100 nm period useful for the fabrication of wire grid polarizers. S-FIL/R has a number of advantages over interference lithography techniques for the fabrication of sub 200 nm period grating structures including but no limited to pattern repeatability, vibration insensitivity, high aspect ratio feature formation, greater extendibility and high resolution. The authors have devised imprint and dry etching processes for resist and substrate patterning to form Al based wire grid polarizers with 100 nm pitch. The fabrication processes and resulting devises will be described. While S-FIL is useful for in the formation of resist patterned wafers, it is also capable of forming devices by functional material patterning. Polymer micro lenses are a good examples of functional material devices useful for a number of applications including CMOS and CCD cameras. The fact that lens geometry is defined by the template and requires no post imprint processing provides a strong advantage over current lens formation approaches. Recent results and the state of current micro lens fabrication by S-FIL is described.
机译：步骤和闪存印记光刻（S-FIL™）工艺是基于UV可固化低粘度液体的步骤和重复纳米压印光刻（NIL）技术。该组和其他人的调查表明，仅通过在模板（模具）上可以创建的结构的大小限制了压印光刻的复位。 S-FIL使用UV可固化液体的现场到现场滴加，以进行步骤和重复图案化。这种方法允许微型和纳米制造具有广泛变化的图案密度和复杂结构的装置。电线栅极偏振器和微透镜是可以使用S-FIL技术形成的光学元件的两个示例。步骤和闪存印记光刻反向（S-FIL / R）音调已用于形成许多不同设备类型的抗蚀剂图案。作者使用了S-FIL / R和干式发育技术，形成具有100nm时段的抗蚀剂图案，用于制造线栅偏振器。 S-FIL / R对干扰光刻技术具有许多优点，用于制造SUB 200nm周期光栅结构，包括但不限于图案可重复性，振动不敏感性，高纵横比特征形成，更高的可扩散性和高分辨率。作者设计了用于抗蚀剂和基板图案的印记和干蚀刻工艺，以形成具有100nm间距的基于基于基的线栅偏振器。将描述制造过程和产生的设计。虽然S-FIL对于抗蚀剂图案化晶片的形成，但它也能够通过功能材料图案化形成装置。聚合物微透镜是用于许多应用包括CMOS和CCD摄像机的应用的功能材料装置的良好示例。镜头几何形状由模板定义，并且不需要发布的压印处理提供强大的优点，这些方法在电流镜片形成方法上提供了强大的优势。描述了S-FIL的最近结果和目前微透镜制造的状态。

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