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首页> 外文会议>Micromachining Technology for Micro-Optics and Nano-Optics IV >Fabrication of Nano and Micro Optical Elements by Step and Flash Imprint Lithography
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Fabrication of Nano and Micro Optical Elements by Step and Flash Imprint Lithography

机译：分步和快速压印光刻技术制备纳米和微光学元件

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The Step and Flash Imprint Lithography (S-FIL™ ) process is a step and repeat nano-imprint lithography (NIL) technique based on UV curable low viscosity liquids. Investigation by this group and others has shown that the resolution of replication by imprint lithography is limited only by the size of the structures that can be created on the template (mold). S-FIL uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning. This approach allows for micro and nano-fabrication of devices with widely varying pattern densities and complicated structures. Wire grid polarizers and micro lenses are two examples for optical components that can be formed using S-FIL technology. Step and Flash Imprint Lithography Reverse (S-FIL/R) tone has been used to form resist patterns for a number of different device types. The authors have employed S-FIL/R and dry develop techniques to form resist patterns with 100 nm period useful for the fabrication of wire grid polarizers. S-FIL/R has a number of advantages over interference lithography techniques for the fabrication of sub 200 nm period grating structures including but no limited to pattern repeatability, vibration insensitivity, high aspect ratio feature formation, greater extendibility and high resolution. The authors have devised imprint and dry etching processes for resist and substrate patterning to form Al based wire grid polarizers with 100 nm pitch. The fabrication processes and resulting devises will be described. While S-FIL is useful for in the formation of resist patterned wafers, it is also capable of forming devices by functional material patterning. Polymer micro lenses are a good examples of functional material devices useful for a number of applications including CMOS and CCD cameras. The fact that lens geometry is defined by the template and requires no post imprint processing provides a strong advantage over current lens formation approaches. Recent results and the state of current micro lens fabrication by S-FIL is described.
机译：分步和快速压印光刻（S-FIL™）工艺是基于UV可固化低粘度液体的分步和重复纳米压印光刻（NIL）技术。该小组和其他小组的研究表明，压印光刻技术的复制分辨率仅受可在模板（模具）上创建的结构尺寸的限制。 S-FIL使用UV固化液体的场到场滴液分配进行分步和重复图案化。这种方法允许对具有广泛变化的图案密度和复杂结构的器件进行微纳米加工。线栅偏振器和微透镜是可以使用S-FIL技术形成的光学组件的两个示例。步进和闪光压印光刻反向（S-FIL / R）色调已用于形成许多不同器件类型的抗蚀剂图案。作者已采用S-FIL / R和干法显影技术来形成具有100 nm周期的抗蚀剂图案，可用于制造线栅偏振器。 S-FIL / R与干涉光刻技术相比，在亚200 nm周期光栅结构的制造中具有许多优势，包括但不限于图案重复性，振动不敏感，高长宽比特征形成，更大的可扩展性和高分辨率。作者已经设计出用于抗蚀剂和基底图案的压印和干法蚀刻工艺，以形成间距为100 nm的基于Al的线栅偏振器。将描述制造过程和产生的设计。虽然S-FIL可用于形成抗蚀剂图案化的晶圆，但它也能够通过功能材料图案化来形成器件。聚合物微透镜是功能材料设备的一个很好的例子，可用于包括CMOS和CCD相机在内的许多应用。与模板形成镜片相比，镜片几何形状由模板定义且无需后期压印处理的事实提供了强大的优势。描述了S-FIL的最新结果和当前微透镜制造的状态。

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