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首页> 外文会议>Symposium on microelectronics technology and devices >Influence of the nitrogen concentration on the photoinduced hydrophilicity of N-doped titanium dioxide thin films deposited by plasma sputtering
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Influence of the nitrogen concentration on the photoinduced hydrophilicity of N-doped titanium dioxide thin films deposited by plasma sputtering

机译：氮浓度对等离子体溅射沉积的N掺杂二氧化钛薄膜光诱导亲水性的影响

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摘要

Titanium dioxide (TiO_2) is a well studied material and commonly used for many photocatalytic (1) and photoelectrochemical (2) applications. In photocatalysis, it has been used for decomposition of water and degradation of organic pollutants in air as well aqueous media. On the other hand, in photoelectrochemistry it has been used in microelectronic devices as, for example, in solar cells applications. Titanium dioxide thin films are easily produced by chemical or physical methods and show good stability under illumination in most environments (3). However, there are some disadvantages as, for example, absorption only in ultraviolet spectrum, once the band gap of this material (around 3.2 eV) is quite high when the crystalline structure is predominantly anatase (4). Then, aiming to improve the photoelectrochemical efficiency it is desirable to red-shift the photoelectrochemical onset to also include the less energetic but more intense visible part of the solar spectrum (3), about which a large number of papers have been published elsewhere (5-7). Nevertheless, substitutional N-doping was found to be particularly effective in decreasing the band gap of anatase below 3.0 eV (8).
机译：二氧化钛（TiO_2）是一种良好的研究材料，通常用于许多光催化（1）和光电化学（2）应用。在光催化中，它已被用于分解水和空气中有机污染物的降解作为水性介质。另一方面，在光电化学中，它已被用于微电子器件，例如在太阳能电池应用中。二氧化钛薄膜通过化学或物理方法容易生产，并且在大多数环境中在照明下显示出良好的稳定性（3）。然而，一旦该材料的带隙（约3.2eV）的晶体结构主要是锐钛矿（4），存在一些缺点。然后，旨在提高光电化学效率，希望将光电化学发作的红移也包括太阳光谱（3）的较低的能量但更强烈的可见部分，大部分纸张已在其他地方发表（5 -7）。然而，发现替代N掺杂在减少3.0eV以下的锐钛酶的带隙时特别有效。

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