首页> 外文会议>Nitride semiconductors >Comparative Analysis of Strain and Stress in MBE and MOCVD grown GaN thin films on sapphire
【24h】

Comparative Analysis of Strain and Stress in MBE and MOCVD grown GaN thin films on sapphire

机译:蓝宝石上MBE和MOCVD生长的GaN薄膜的应变和应力比较分析

获取原文
获取原文并翻译 | 示例

摘要

In this study, the causes of biaxial and hydrostatic stress components in epi-taxially grown thin GaN films on sapphire are analyzed. It is observed that growth by Molecular Beam Epitaxy (MBE) and by Metal Organic Chemical Vapor Deposition (MOCVD) are governed by very similar physical principles. Differences in the absolute stress values are mainly due to the difference in growth temperature. It is argued that in the case of MOCVD growth the onset of plasticity for higher growth temperatures is responsible for a larger stress relaxation in the buffer layer. It is further found that either process can result in highly off-stoichiometric GaN layers, as manifested by the large variations in the a and c lattice parameters caused by intrinsic point defects.
机译:在这项研究中,分析了蓝宝石上外延生长的GaN薄膜中双轴和静水应力分量的成因。观察到,通过分子束外延(MBE)和金属有机化学气相沉积(MOCVD)的生长受非常相似的物理原理支配。绝对应力值的差异主要是由于生长温度的差异。有人认为,在MOCVD生长的情况下,较高生长温度的可塑性开始是缓冲层中应力松弛较大的原因。进一步发现,这两种方法都可能导致化学计量比高的GaN层,这由固有点缺陷引起的a和c晶格参数的巨大变化所证明。

著录项

  • 来源
    《Nitride semiconductors》|1997年|447-452|共6页
  • 会议地点 Boston MA(US)
  • 作者单位

    Department of Materials Science, University of California at Berkeley;

    Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;

    Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;

    Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;

    Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;

    Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;

    Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;

    Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;

    Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;

    Ma;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 材料;
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号