Department of Materials Science, University of California at Berkeley;
Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;
Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;
Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;
Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;
Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;
Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;
Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;
Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA;
Ma;
机译:MBE和MOCVD生长的外延GaN薄膜的比较电子光谱分析
机译:用rf-MBE和MOCVD在邻域蓝宝石(0001)衬底上生长的GaN膜的表面形貌比较
机译:使用超薄缓冲液对蓝宝石上的PA-MBE生长的AlGaN / GaN异质结构进行全面的应变和带隙分析
机译:蓝宝石中MBE和MOCVD生长GaN薄膜的应变和应力的比较分析
机译:通过发光光谱和X射线衍射测定在6H-SiC(0001)衬底上生长的GaN和Al(x)Ga(1-x)N薄膜的应变和组成。
机译:HVPE生长的GaN晶体中的应力对MOCVD-GaN / 6H-SiC衬底的影响
机译:pa-mBE生长alGaN / GaN异质结构在超薄缓冲层蓝宝石上的综合应变和带隙分析
机译:观察蓝宝石上mBE生长的GaN薄膜的受激发射。