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Immersion Lithography Robustness for the C065 node

机译:C065节点的浸没式光刻鲁棒性

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This initial assessment of immersion industrialization and the possible 'plunge and play' into a manufacturing environment for C065 process shows that immersion technology is still not fully matured and thus cannot be implemented into the C065 process at this time. On the positive side is the imaging performance, but the negatives of defectivity, overlay, and most COO (not discussed in this paper) are strong indicators that the process is still very much in a R&D phase. We are confident that progress is being made and will be seen for the C045 node. In this work, no process optimization was undertaken to improve the defectivity performance. This level of work will be undertaken in the next steps of immersion development.
机译:对沉浸式工业化的初步评估以及对C065工艺可能进入制造环境的“跳水”影响表明,沉浸技术仍未完全成熟,因此目前无法在C065工艺中实施。好的方面是成像性能,但是缺陷率,覆盖率和大多数COO(本文未讨论)的缺点是有力的指标,表明该过程仍处于研发阶段。我们相信C045节点将会取得进展,并且会看到进展。在这项工作中,没有进行工艺优化来改善缺陷性能。此水平的工作将在沉浸式开发的后续步骤中进行。

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