Lens distortion for liquid renovation in immersion lithography

Hui Chen; Wenyu Chen; Jun Zou; Xin Fu

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Lens distortion for liquid renovation in immersion lithography

机译：浸没式光刻中液体翻新的透镜变形

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摘要

Liquid renovation is perhaps the best method to reduce contamination in immersion lithography, but it brings lens distortion because of the high density and viscosity of the immersion liquids compared to air. In this paper, considering wafer scanning, the three-dimensional computational liquid dynamics model and finite-element model are developed to investigate the lens distortion for immersion liquid renovation. After analyzing the influence of wafer scanning directions, the empirical formulas of the lens distortion for three-dimensional model are established to describe the effect of the parameters of lens and polymer which are used to mount lens and the parameters of immersion liquid flow on lens distortion.

机译：液体翻新也许是减少浸没式光刻过程中污染的最佳方法，但是由于浸没液体与空气相比具有较高的密度和粘度，因此会带来透镜变形。本文考虑晶片扫描，建立了三维计算液体动力学模型和有限元模型，以研究浸入式液体翻新中的透镜畸变。在分析了晶片扫描方向的影响后，建立了三维模型的透镜畸变经验公式，描述了用于安装透镜的透镜和聚合物参数以及浸没液流参数对透镜畸变的影响。。

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来源
《Microelectronic Engineering》 |2011年第8期|p.2200-2204|共5页
作者
Hui Chen; Wenyu Chen; Jun Zou; Xin Fu;
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作者单位

The State Key Laboratory of Fluid Power Transmission and Control, Zhejiang University, Hangzhou 310027, China;

The State Key Laboratory of Fluid Power Transmission and Control, Zhejiang University, Hangzhou 310027, China;

The State Key Laboratory of Fluid Power Transmission and Control, Zhejiang University, Hangzhou 310027, China;

The State Key Laboratory of Fluid Power Transmission and Control, Zhejiang University, Hangzhou 310027, China;

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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
原文格式 PDF
正文语种 eng
中图分类
关键词
immersion lithography; lens distortion; liquid renovation;

机译：浸没式光刻;透镜畸变;液体修复;

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1. Liquid immersion lithography using water as an immersion liquid: role of orientation contributions to light scattering at 193 nm [J] . M. Letz, K. Knapp Journal of Microlithography, Microfabrication, and Microsystems. (JM3) . 2004,第4期

机译：使用水作为浸没液的液体浸没光刻：取向对193 nm处的光散射的作用
2. Liquid immersion lithography using water as an immersion liquid: role of orientation contributions to light scattering at 193 nm [J] . M. Letz, K. Knapp Journal of Microlithography, Microfabrication, and Microsystems. (JM3) . 2004,第4期

机译：使用水作为浸没液的液体浸没光刻：取向对193 nm处的光散射的作用
3. High refractive index Fresnel lens on a fiber fabricated by nanoimprint lithography for immersion applications [J] . Koshelev Alexander, Calafiore Giuseppe, Pina-Hernandez Carlos, Optics Letters . 2016,第15期

机译：通过纳米压印光刻技术在光纤上制造的高折射率菲涅耳透镜，可用于浸泡应用
4. Optical Coupling of Lens, Liquid and Resist in Immersion Lithography: Rigorous Model and Assessment [C] . Mosong Cheng, Benjamin Ho, Richard Yamaguchi, Conference on Optical Microlithography XVII pt.1; 20040224-20040227; Santa Clara,CA; US . 2004

机译：浸没式光刻中镜片，液体和抗蚀剂的光学耦合：严格的模型和评估
5. The refractive index and absorbance of aqueous and organic fluids for immersion lithography. [D] . Costner, Elizabeth A. 2009

机译：用于浸没式光刻的水性和有机液体的折射率和吸收率。
6. Solvent immersion imprint lithography: A high-performance semi-automated procedure [O] . S. H. Nemati, D. A. Liyu, A. J. Canul, 2017

机译：溶剂浸渍压印光刻：高性能半自动程序
7. Effects of Structural Parameters on Liquid Flowing in Immersion Lithography [O] . Liang ZHENG, Yu CHEN 2019

机译：结构参数对浸入光刻流动的影响

Lens distortion for liquid renovation in immersion lithography

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