...
首页> 外文期刊>Molecular Crystals and Liquid Crystals >The Properties of a-Si:H p-i-n Solar Cell by Intrinsic Layer's Thickness
【24h】

The Properties of a-Si:H p-i-n Solar Cell by Intrinsic Layer's Thickness

机译:基于本征层厚度的a-Si:H p-i-n太阳能电池的性能

获取原文
获取原文并翻译 | 示例
           

摘要

The hydrogenated amorphous silicon p-i-n solar cells have been deposited on indium tin oxide glass by using the PECVD. Solar cells were fabricated with various thicknesses [50-300 nm] of the i-layer, while the thicknesses of the p- and n-layer were fixed to 25Â nm and 50 nm, respectively. The solar simulator shows the highest value of short-circuit current density and efficiency that are of 6.32 mA/cm2 and 1.36%, respectively for the solar cell with a thickness of 200 nm and the open-circuit voltage is the highest value when thickness of the i-layer is 150 nm.
机译:氢化非晶硅p-i-n太阳能电池已通过使用PECVD沉积在氧化铟锡玻璃上。太阳能电池被制造成具有i层的各种厚度[50-300 nm],而p层和n层的厚度分别固定为25 nm和50 nm。对于厚度为200 nm的太阳能电池和开路的太阳能模拟器,短路电流密度和效率的最大值分别为6.32 mA / cm 2 和1.36%。当i层的厚度为150 nm时,电压为最大值。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号