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Low Power High Static Noise Margin with Material Parameter of SRAM Cell Design Considering Nano-Scaled Technology and Transistor Ratio

机译:考虑纳米尺度技术和晶体管比率的具有SRAM单元设计材料参数的低功耗高静态噪声裕量

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摘要

This paper presents the comprehensive summary of low power 7T SRAM cell design with power reduction in both active and standby mode. This paper proposes 7T SRAM cell structure which has no direct path through BL to data storage node, so this cell structure has higher forbearance against external noise in this way it can retain exact data at storage node. As we are using 45 nm technology for 7T SRAM cell design we can reduce size by great extent. In proposed 7T SRAM cell design, transistors are arranged in such a manner by which data destruction never occurs in the read operation. The simulation result shows that Static Noise Margin (SNM) of proposed 7T SRAM cell design is enhanced compare to other existing designs. Various operating parameter are also calculated for proposed 7T SRAM cell.
机译:本文介绍了低功耗7T SRAM单元设计的全面总结,该设计在工作和待机模式下均降低了功耗。本文提出了一种7T SRAM单元结构,该结构没有直接通过BL到达数据存储节点的路径,因此这种单元结构具有更高的抵御外部噪声的能力,从而可以在存储节点上保留准确的数据。由于我们将45 nm技术用于7T SRAM单元设计,因此可以在很大程度上减小尺寸。在提出的7T SRAM单元设计中,晶体管的排列方式使得在读取操作中不会发生数据破坏。仿真结果表明,与其他现有设计相比,拟议的7T SRAM单元设计的静态噪声容限(SNM)有所增强。还针对建议的7T SRAM单元计算了各种工作参数。

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