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Gold nanoisland arrays by repeated deposition and post-deposition annealing for surface-enhanced Raman spectroscopy

机译：通过重复沉积和沉积后退火进行表面增强拉曼光谱的金纳米岛阵列

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Gold nanoisland arrays with well controlled growth were achieved by repeated sputtering deposition and post-deposition annealing processes. When each deposition was set at 5 nm (nominal thickness based on gold mass), the single deposition and annealing process (single process) yielded gold nanoisland arrays with an average diameter of ～16 nm based on top view scanning electron microscopy (SEM). When the deposition and annealing process was repeated two more times (triple process), top view SEM showed the nanoisland arrays grew to ～38 nm in average diameter. The surface-enhanced Raman spectroscopy (SERS) measurement indicated that triple processed nanoisland arrays led to the highest SERS enhancement, suggesting the necessity of pursuing nanoislands with larger sizes. The gold nanoisland arrays after the triple process were further sputtered with a final layer of gold thin film at different nominal thicknesses. An optimal nominal thickness for SERS was determined experimentally at ～40 nm, as a result of the competition between the positive and negative effects of the final gold deposition. Last, the uniformity of the optimized SERS substrate was investigated on a 5 cm × 5 cm platform. SERS measurements demonstrated a relative standard deviation of ～7% in terms of spectral variation over the entire substrate, rendering the process in the present study a promising fabrication approach for large-scale production of SERS substrates.
机译：通过重复的溅射沉积和沉积后退火工艺，可以实现具有良好控制生长的金纳米岛阵列。当每次沉积设置为5 nm（基于金质量的名义厚度）时，基于顶视图扫描电子显微镜（SEM），单次沉积和退火过程（单过程）产生的平均直径为〜16 nm的金纳米岛阵列。当沉积和退火过程再重复两次（三重过程）时，顶视图SEM显示纳米岛阵列的平均直径增长到〜38 nm。表面增强拉曼光谱法（SERS）的测量表明，三重处理的纳米岛阵列导致最高的SERS增强，表明有必要追求更大尺寸的纳米岛。三重工艺之后的金纳米岛阵列进一步溅射了一层具有不同标称厚度的金薄膜。由于最终金沉积的正负作用之间的竞争，通过实验确定了SERS的最佳标称厚度。最后，在5 cm×5 cm的平台上研究了优化的SERS基材的均匀性。 SERS测量结果表明，整个基板上的光谱变化相对标准偏差约为7％，这使本研究中的工艺成为大规模生产SERS基板的有希望的制造方法。

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