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Simple and scalable preparation of master mold for nanoimprint lithography

机译：用于纳米压印光刻的母模简单且可扩展的制备

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Nanoimprint lithography (NIL) is one of the most prominent bottom-up techniques for duplicating nanostructures with a high throughput. However, fabrication of starting master mold commonly requires expensive equipment of top-down techniques, or additional steps to transfer the fabricated patterns from bottom-up methods. Here we demonstrate that a SiO2 nanostructure manufactured from a self-assembled block copolymer, polystyrene-b-polydimethylsiloxane (PS-b-PDMS), directly serves as a master mold for NIL without further modification. A hexagonally aligned pattern over the entire substrate is established using a simple technique; solvent annealing and etching. Etching also plays an important role in endowing fluorine on the surface of SiO2, thus promoting smooth demolding upon imprinting. The obtained pattern of the SiO2 nanostructure is transferred to a polymer surface using UV nanoimprint. Identical patterns of the SiO2 nanostructure are elaborately reproduced on Ni and Cu nanodot arrays via electroplating on the polymer transcript, which was verified by morphological observations. The uniformity of the replicated Ni nanodot array is evaluated using spectroscopic ellipsometry. The measured optical response of the Ni nanodot is validated by electromagnetically simulated results, indicating that the pattern transfer is not limited to a small local area. In addition, the durability of the SiO2 mold pattern is corroborated after the imprinting process, thus guaranteeing the reusability of the fabricated nanostructure as a master mold. The proposed approach does not require any high-end lithographic techniques; this may result in significant cost and time reductions in future nanofabrication.
机译：NanoImprint光刻（NIL）是具有高通量的复制纳米结构最突出的自下而上的技术之一。然而，启动母模的制造通常需要昂贵的自上而下技术的设备，或从自下而上的方法转移制造图案的附加步骤。在这里，我们证明由自组装块共聚物，聚苯乙烯-B-聚二甲基硅氧烷（PS-B-PDMS）制造的SiO2纳米结构直接用作含量的母模，而无需进一步改变。使用简单的技术建立整个基板上的六角对齐模式;溶剂退火和蚀刻。蚀刻在SiO 2表面上的氟也起着重要作用，从而在压印时促进平滑脱模。使用紫外线纳米压印将获得的SiO2纳米结构的图案转移至聚合物表面。通过在聚合物转录物上通过电镀在Ni和Cu nanoot阵列上精确地再现SiO2纳米结构的相同图案，其通过形态学观察验证。使用光谱椭圆形测定，评估复制的Ni纳米粒子阵列的均匀性。通过电磁模拟结果验证Ni Nanoot的测量光学响应，表明图案传输不限于小型局部区域。另外，在压印过程之后，SiO 2模具图案的耐久性被证实，从而保证了制造的纳米结构作为母模的可重用性。该方法不需要任何高端光刻技术;这可能导致未来纳米制备的显着成本和时间减少。

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