The fabrication of Co-Pt electro-deposited bit patterned media with nanoimprint lithography

Sohn JS; Lee D; Cho E; Kim HS; Lee BK; Lee MB; Suh SJ

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The fabrication of Co-Pt electro-deposited bit patterned media with nanoimprint lithography

机译：纳米压印光刻技术制备Co-Pt电沉积位图介质

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摘要

Bit patterned media with 25 nm hole diameter and 50 nm pitch size were fabricated with serial processes comprising master patterning with electron-beam lithography, a Si etching process, multi- layer soft stamp replication, and UV nanoimprinting, followed by Co-Pt magnetic material filling by electro- deposition. From these processes, the designed patterns were well defined, and perpendicular magnetic anisotropy of the fabricated bit patterned media was obtained.

机译：通过一系列工艺制造具有25 nm孔径和50 nm间距尺寸的位图介质，这些工艺包括电子束光刻的主图样，Si蚀刻工艺，多层软印模复制和UV纳米压印，然后是Co-Pt磁性材料通过电沉积填充。通过这些过程，可以很好地定义设计的图案，并获得所制造的位图案化介质的垂直磁各向异性。

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来源
《Nanotechnology》 |2009年第2期|共5页
作者
Sohn JS; Lee D; Cho E; Kim HS; Lee BK; Lee MB; Suh SJ;
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正文语种 eng
中图分类一般工业技术;
关键词
MAGNETIC STORAGE; DENSITY; GBIT/IN(2); NOISE; FILMS;

机译：磁存储;密度;GBIT / IN（2）;噪声;薄膜;

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专利

1. The fabrication of Co-Pt electro-deposited bit patterned media with nanoimprint lithography [J] . Sohn JS, Lee D, Cho E, Nanotechnology . 2009,第2期

机译：纳米压印光刻技术制备Co-Pt电沉积位图介质
2. A Polyferroplatinyne Precursor for the Rapid Fabrication of L1_0-FePt-type Bit Patterned Media by Nanoimprint Lithography [J] . Qingchen Dong, Guijun Li, Cheuk-Lam Ho, Advanced Materials . 2012,第8期

机译：纳米压印光刻技术快速制备L1_0-FePt型位图案介质的聚铁铂前体
3. Integration of nanoimprint lithography with block copolymer directed self-assembly for fabrication of a sub-20 nm template for bitpatterned media [J] . XiaoMin Yang, Shuaigang Xiao, Wei Hu, Nanotechnology . 2014,第39期

机译：纳米压印光刻技术与嵌段共聚物定向自组装的集成，用于制造位图介质的20 nm以下模板
4. 25nm pitch master and replica mold fabrication for nanoimprinting lithography for 1Tbit/inchsup2/sup bit patterned media [C] . Hideo Kobayashi, Shuji Kishimoto, Kouta Suzuki, Alternative lithographic technologies IV. . 2012

机译：用于1Tbit / inch ^{2 位图案化介质的纳米压印光刻的25nm间距母版和复制品模具制造}
5. Step and flash imprint lithography: Fabrication of patterned media for extremely high density magnetic data storage devices. [D] . Joshi, Nikhil. 2007

机译：分步和快速压印光刻：用于超高密度磁性数据存储设备的图案化介质的制造。
6. Large-scale fabrication of nanopatterned sapphire substrates by annealing of patterned Al thin films by soft UV-nanoimprint lithography [O] . Lin Cui, Jie-Cai Han, Gui-Gen Wang, 2013

机译：通过软紫外-纳米压印光刻技术对图案化的Al薄膜进行退火处理大规模制造纳米图案化的蓝宝石衬底
7. A polyferroplatinyne precursor for the rapid fabrication of L10-FePt-type bit patterned media by nanoimprint lithography [O] . Dong Q, Li G, Ho CL, 2012

机译：一种通过纳米压印光刻技术快速制造L10-FePt型位图介质的聚铁铂前体
8. Nanoimprint Lithography of Parallel Patterning of Nanoscale Magnetoelectronic Devices [R] . Kong, L. , Koecher, L. 2002

机译：纳米级磁电子器件平行构图的纳米压印光刻技术

The fabrication of Co-Pt electro-deposited bit patterned media with nanoimprint lithography

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