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Terbium-based extreme ultraviolet multilayers

机译:b基极紫外多层膜

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We have fabricated periodic multilayers that comprise either Si/Tb or SiC/Tb bilayers, designed to operate as narrowband reflective coatings near 60 nm wavelength in the extreme ultraviolet (EUV). We find peak reflectance values in excess of 20percent near normal incidence. The spectral bandpass of the best Si/Tb multilayer was measured to be 6.5 nm full width at half-maximum (FWHM), while SiC/Tb multilayers have a more broad response, of order 9.4 nm FWHM. Transmission electron microscopy analysis of Si/Tb multilayers reveals polycrystalline Tb layers, amorphous Si layers, and relatively large asymmetric amorphous interlayers. Thermal annealing experiments indicate excellent stability to 100 deg C (1 h) for Si/Tb. These new multilayer coatings have the potential for use in normal incidence instrumentation in a region of the EUV where efficient narrowband multilayers have not been available until now. In particular, reflective Si/Tb multilayers can be used for solar physics applications where the coatings can be tuned to important emission lines such as O V near 63.0 nm and Mg X near 61.0 nm.
机译:我们已经制造出包含Si / Tb或SiC / Tb双层的周期性多层,这些双层被设计为在极端紫外线(EUV)中用作60 nm波长附近的窄带反射涂层。我们发现反射率峰值接近正常发生率的20%以上。最佳Si / Tb多层的光谱带通测量为半峰全宽(FWHM)为6.5 nm,而SiC / Tb多层具有更宽的响应,约为9.4 nm FWHM。 Si / Tb多层膜的透射电子显微镜分析显示了多晶Tb层,非晶Si层和相对较大的不对称非晶中间层。热退火实验表明,Si / Tb在100摄氏度(1 h)下具有出色的稳定性。这些新的多层涂层具有在迄今为止尚未获得有效的窄带多层涂层的EUV地区的法向入射仪器中使用的潜力。尤其是,反射Si / Tb多层可用于太阳能物理应用,其中可以将涂层调整到重要的发射线,例如63.0 nm附近的O V和61.0 nm附近的MgX。

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