首页> 外文期刊>Physica, C. Superconductivity and its applications >TUNNEL BARRIER GROWTH DYNAMICS OF NB/ALOX-AL/NB AND NB/ALNX-AL/NB JOSEPHSON JUNCTIONS
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TUNNEL BARRIER GROWTH DYNAMICS OF NB/ALOX-AL/NB AND NB/ALNX-AL/NB JOSEPHSON JUNCTIONS

机译:NB / ALOX-AL / NB和NB / ALNX-AL / NB JOSEPHSON结的隧道壁增长动力学

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The growth of very thin aluminum oxide and aluminum nitride tunnel barriers on top of an about 7 nm aluminum layer is deduced by measurements of the reflectivity change of a laser beam due to the decrease of the aluminum laser thickness. Within the first seconds of the process thermal aluminum oxide grows much faster than aluminum nitride in a nitrogen plasma. For both barrier types the reflectivity change can be correlated with the Josephson current density of the finished junctions. In a semi-logarithmic scale the current density versus reflectivity change can be approximated by a straight line up to 20 kA/cm2. High current densities with AlNx seem to be more easily controllable than with AlOx. [References: 12]
机译:通过测量由于铝激光厚度的减小而引起的激光束反射率变化的测量,可以推断出在约7 nm铝层顶部上非常薄的氧化铝和氮化铝隧道势垒的生长。在该过程的最初几秒钟内,热氧化铝在氮等离子体中的生长速度快于氮化铝。对于这两种势垒类型,反射率变化都可以与完成结的约瑟夫森电流密度相关。在半对数标度中,电流密度与反射率变化的关系可以通过一条直线来近似,最高可达20 kA / cm2。 AlNx的高电流密度似乎比AlOx容易控制。 [参考:12]

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