Department of Electrical and Computer Engineering, Illinois Institute of Technology, Chicago, USA;
Tyndall National Institute, University College Cork, Ireland;
Tyndall National Institute, University College Cork, Ireland;
Tyndall National Institute, University College Cork, Ireland;
Tyndall National Institute, University College Cork, Ireland;
Queen's University, Belfast, Northern Ireland;
Queen's University, Belfast, Northern Ireland;
Department of Electrical and Computer Engineering, Illinois Institute of Technology, Chicago, USA;
dielectric materials; gallium compounds; III-V semiconductors; nanowires; sapphire; Schottky diodes; technology CAD (electronics); wide band gap semiconductors;
机译:通过自上而下的制造方法垂直的GaN-On-GaN纳米线肖特基屏障二极管
机译:自由GaN衬底上垂直GaN肖特基势垒二极管和p-n二极管正向电流/电压特性的数值分析
机译:设计考虑高电压Ga
机译:垂直GaN纳米线肖特基势垒二极管的设计考虑因素
机译:SiC上的肖特基势垒二极管的设计与制造。
机译:通过电感耦合等离子体(ICP)和器件特性优化准垂直GaN肖特基势垒二极管(SBD)的台面蚀刻
机译:GaN纳米线肖特基势垒二极管