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Design considerations of vertical GaN nanowire Schottky barrier diodes

机译:垂直GaN纳米线肖特基势垒二极管的设计注意事项

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Design considerations for vertical Gallium Nitride (GaN) nanowire Schottky barrier diodes (NWSBDs) for high voltage applications is discussed in this paper. Preliminary quasi-vertical NWSBDs fabricated on a Sapphire substrate show rectifying properties with breakdown voltage of 100 V. The principle of dielectric Reduced SURface Field (RESURF) which is naturally compatible with the NW structure, is utilized to block high voltages (> 600 V) within the fabrication constraints of nano-pillar height and drift doping concentration. Design considerations for the NWSBD is explored through 3D TCAD simulations. TCAD simulations show the NWSBDs can block voltages upward of 700 V with very low on-resistance with optimal design. The measured and simulated results are compared with state of the art GaN devices to provide an understanding of the true potential of the GaN NW architecture as power devices offering high breakdown voltages and low on-state resistance and a reliable device operation, all on a vertical architecture and a non-native substrate.
机译:本文讨论了用于高压应用的垂直氮化镓(GaN)纳米线肖特基势垒二极管(NWSBD)的设计注意事项。在蓝宝石衬底上制造的初步准垂直NWSBD具有击穿电压为100 V的整流特性。电介质还原表面场(RESURF)原理与NW结构自然兼容,可用来阻挡高压(> 600 V)在纳米柱高和漂移掺杂浓度的制造限制内。通过3D TCAD仿真探索了NWSBD的设计注意事项。 TCAD仿真显示,通过优化设计,NWSBD可以以极低的导通电阻阻断700 V以上的电压。将测量和模拟的结果与最新的GaN器件进行比较,以了解GaN NW架构的真正潜力,因为功率器件在垂直方向上都提供高击穿电压和低导通电阻以及可靠的器件操作架构和非本机基底。

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