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首页> 外文会议>Conference on Optical Microlithography XV Pt.2, Mar 5-8, 2002, Santa Clara, USA >Production-Ready 4 kHz ArF Laser for 193 nm Lithography
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Production-Ready 4 kHz ArF Laser for 193 nm Lithography

机译：适用于193 nm光刻的可量产的4 kHz ArF激光器

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摘要

Semiconductor chip manufacturing is on the verge of a new production process node driving critical feature sizes below 100 nm. The next generation of 193 nm Argon Fluoride laser, the NanoLith~(TM)7000, has been developed in response to this recent technology development in the lithography industry. The NanoLithT 7000, offering 20 Watts average output power at 4 kHz repetition rate, is designed to support the highest exposure tool scan speeds for maximum productivity and wafer throughput. Technology improvements to support the move from pilot production to full production will be described. With core technology defined and performance to specification established, attention turns to cost of operation, which is closely tied to module lifetime and reliability. Here we present results of the NanoLith~(TM) 7000 system lifetest tracking all optical performance data over a 4.4 Billion shot. The system is operated in firing modes ranging from 1-4 kHz, and up to 75% duty cycle. Overall system performance measured to date both in the lab and in the field suggests that this laser meets all the production requirements for 193 nm lithography.
机译：半导体芯片制造即将到来，新的生产工艺节点将关键特征尺寸控制在100 nm以下。响应于光刻行业最近的这一技术发展，已开发出下一代193 nm氩氟化物激光器NanoLithTM 7000。 NanoLithT 7000以4 kHz的重复频率提供20瓦的平均输出功率，旨在支持最高的曝光工具扫描速度，从而实现最高的生产率和晶圆产量。将描述支持从试生产到全面生产的技术改进。在定义了核心技术并建立了规范的性能后，注意力就转移到了操作成本上，这与模块的寿命和可靠性密切相关。在这里，我们展示了NanoLithTM 7000系统寿命测试的结果，该结果跟踪了44亿个镜头中的所有光学性能数据。该系统在1-4 kHz的发射模式下运行，占空比高达75％。迄今为止，在实验室和现场测量的总体系统性能表明，该激光器满足了193 nm光刻的所有生产要求。

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