High-refractive index nanoparticle fluids for 193-nm immersion lithography

机译：高折射率纳米颗粒流体为193-NM浸入式光刻

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A critical issue preventing the implementation of 193nm immersion lithography (193i) to the 32nm node is the availability of high refractive index (n > 1.8) and low optical absorption fluids. To overcome these issues, we have synthesized high refractive index nanoparticles and introduced them into the immersion fluid to increase the refractive index. Hydrolysis and sol-gel methods have been implemented to grow high refractive index nanoparticles with diameters of 3-4nm. Depending on the synthetic route, it is possible to produce stable suspensions of nanoparticles in either aqueous or organic solvents, making it possible to synthesize a stable high-index immersion fluid.

机译：防止实施193NM浸入光刻（193i）到32nm节点的关键问题是高折射率（n> 1.8）和低光吸收流体的可用性。为了克服这些问题，我们已经合成了高折射率纳米颗粒，并将它们引入浸入液体以增加折射率。已经实施了水解和溶胶 - 凝胶方法以使直径为3-4nm的高折射率纳米颗粒。取决于合成途径，可以在水性或有机溶剂中产生纳米颗粒的稳定悬浮液，使得可以合成稳定的高折射率浸入液体。

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《SPIE Conference on Advances in Resist Materials and Processing Technology》|2009年||共6页
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Markos Trikeriotis; Robert Rodriguez; Michael F. Zettel; Aristeidis Bakandritsos; Woo Jin Bae; Paul Zimmerman; Christopher K. Ober; Emmanuel P. Giannelis;
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中图分类 N-532;
关键词
hafnium oxide; immersion lithography; 193nm; nanoparticles; high refractive index; viscosity;

机译：氧化铪;浸入光刻;193nm;纳米颗粒;高折射率;粘度;

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专利

1. A study of 193-nm immersion lithography using novel high refractive index fluids [J] . Julius Santillan, Akihiko Otoguro, Toshiro Itani, Microelectronic Engineering . 2006,第4a9期

机译：使用新型高折射率流体对193 nm浸没式光刻技术的研究
2. Simulation of the 45-nm half-pitch node with 193-nm immersion lithography-imaging interferometric lithography and dipole illumination [J] . Abani Biswas, Steven R. J. Brueck Journal of Microlithography, Microfabrication, and Microsystems. (JM3) . 2004,第1期

机译：用193nm浸没式光刻成像干涉光刻和偶极子照明对45nm半节距节点进行仿真
3. Simulation of the 45-nm half-pitch node with 193-nm immersion lithography-imaging interferometric lithography and dipole illumination [J] . Abani Biswas, Steven R. J. Brueck Journal of Microlithography, Microfabrication, and Microsystems. (JM3) . 2004,第1期

机译：用193nm浸没式光刻成像干涉光刻和偶极子照明对45nm半节距节点进行仿真
4. High-refractive index nanoparticle fluids for 193-nm immersion lithography [C] . Markos Trikeriotis, Robert Rodriguez, Michael F. Zettel, Advances in resist materials and processing technology XXVI . 2009

机译：用于193 nm浸没式光刻的高折射率纳米粒子流体
5. The refractive index and absorbance of aqueous and organic fluids for immersion lithography. [D] . Costner, Elizabeth A. 2009

机译：用于浸没式光刻的水性和有机液体的折射率和吸收率。
6. Solvent immersion imprint lithography: A high-performance semi-automated procedure [O] . S. H. Nemati, D. A. Liyu, A. J. Canul, 2017

机译：溶剂浸渍压印光刻：高性能半自动程序
7. Synthesis of high-refractive index sulfur containing polymers for 193-nm immersion lithography: A progress report [O] . Blakey I, Conley W, George GA, 2006

机译：用于193 nm浸没式光刻的高折射率含硫聚合物的合成：进展报告

High-refractive index nanoparticle fluids for 193-nm immersion lithography

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