High-refractive index nanoparticle fluids for 193-nm immersion lithography

著录项

• 来源
  《Advances in resist materials and processing technology XXVI》|2009年|72732A.1-72732A.6|共6页
• 会议地点 San Jose CA(US)
• 作者

  Markos Trikeriotis; Robert Rodriguez; Michael F. Zettel; Aristeidis Bakandritsos; Woo Jin Bae; Paul Zimmerman; Christopher K. Ober; Emmanuel P. Giannelis;

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• 作者单位

  Dept. of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA;

  Dept. of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA;

  Dept. of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA;

  Dept. of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA;

  Dept. of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA;

  Intel assignee to SEMATECH, Inc;

  Dept. of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA;

  Dept. of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA;

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• 会议组织
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  hafnium oxide; immersion lithography; 193nm; nanoparticles; high refractive index; viscosity;

  机译：氧化浸没式光刻； 193纳米;纳米粒子高折射率黏度;