Defining the Role of SEM Metrology for Advanced Process Control

机译：定义SEM Metrologology进行高级过程控制的作用

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The creation of such a system with a communication link between the mask designer and lithography and process engineering of consequent operations can be broken down into two problems: 1. Organization of the interaction of services performed by APC; 2. Reliability of the measurement information obtained in SEM CD metrology. We will focus on the second problem. The effectiveness of the operation of the APC system depends on the reliability (precision and accuracy) of the measurement outcomes.

机译：在掩模设计器和光刻和过程工程之间创建这样的系统，可以分为两个问题，可以分为两个问题：1。组织由APC执行的服务的交互; 2. SEM CD计量中获得的测量信息的可靠性。我们将专注于第二个问题。 APC系统的操作的有效性取决于测量结果的可靠性（精度和精度）。

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《Conference on Metrology, Inspection, and Process Control for Microlithography》|2006年||共7页
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作者
A. Nikitin; A. Sicignano; D. Yeremin; M. Sandy; T. Goldburt; SPIE-The International Society for Optical Engineering;
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正文语种
中图分类光刻、掩膜;
关键词
advanced process control; SEM metrology;

机译：高级过程控制;SEM Metrology;

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Defining the Role of SEM Metrology for Advanced Process Control

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