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首页> 外文会议>MEMS/MOEMS Technologies and Applications II >Single Crystalline Silicon Micromirror Array for Maskless Photolithography in Protein Synthesis Systems
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Single Crystalline Silicon Micromirror Array for Maskless Photolithography in Protein Synthesis Systems

机译：用于蛋白质合成系统中无掩模光刻的单晶硅微镜阵列

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摘要

This paper presents the design, fabrication, and testing of a single crystalline silicon (SCS) micromirror array (MMA) for peptide synthesis applications. Also, preliminary peptide synthesis experiments are presented for the proof of MMA performance. The application specific MMA had a simple fabrication process (only 3 photomasks), large mirror size (210 x 210 μm~2) and proper separation (60μm). In order to obtain reliable structure and characteristics, we incorporated silicon on insulator (SOI) wafer and stepper photolithography. To maximize the pull-in voltage uniformity, sequential designing steps were described considering design limitations. The proposed fabrication process showed that the fabrication yield was very high up to 91.3 %. The total array size consisted of 16 x 16 mirrors and tilting angle was 8.5° for left side or right side operations. The surface roughness was very low and less than 4 nm. The switching time of 156 μsec was reasonable since the exposure time during peptide synthesis was a few seconds. The fabricated MMA had a little pull-in voltage non-uniformity because of dimensional non-uniformities or fabrication errors. We have implemented an automated pull-in voltage measurement setup for verifying the pull-in voltage variation among the array. The measured pull-in voltage among 256 mirrors had the average of 96.99 V and the standard deviation of 2.12 V. The fabricated and analyzed MMA was adapted to the automatic peptide synthesis system and the peptide synthesis experiments showed that the SCS MMA improved the synthesis performance.
机译：本文介绍了用于肽合成应用的单晶硅（SCS）微镜阵列（MMA）的设计，制造和测试。另外，提出了初步的肽合成实验以证明MMA的性能。专用MMA具有简单的制造工艺（仅3个光掩模），较大的反射镜尺寸（210 x 210μm〜2）和适当的间隔（60μm）。为了获得可靠的结构和特性，我们结合了绝缘体上硅（SOI）晶片和步进光刻技术。为了最大程度提高引入电压的均匀性，考虑了设计限制，描述了顺序设计步骤。所提出的制造工艺表明，制造良率高达91.3％。阵列的总大小由16 x 16个反射镜组成，左侧或右侧操作的倾斜角度为8.5°。表面粗糙度非常低并且小于4nm。 156μsec的切换时间是合理的，因为肽合成过程中的暴露时间为几秒钟。由于尺寸不均匀或制造误差，所制造的MMA具有少许引入电压不均匀性。我们已经实现了自动引入电压测量设置，以验证阵列之间的引入电压变化。在256个反射镜之间测得的吸合电压平均为96.99 V，标准偏差为2.12V。制备和分析的MMA适用于自动肽合成系统，肽合成实验表明SCS MMA可提高合成性能。

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