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首页> 外文会议>Metrology, Inspection, and Process Control for Microlithography XX pt.2 >Carbon Nanotube AFM Probes for Microlithography Process Control
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Carbon Nanotube AFM Probes for Microlithography Process Control

机译：用于微光刻工艺控制的碳纳米管AFM探针

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摘要

The use of carbon nanotubes (CNT) as probes for atomic force microscopy (AFM) has been studied worldwide for more than a decade; however, the industries have not widely accepted CNT probes in their day-to-day operation. In this work, we present a series of studies on the metrology performance of CNT probes in semiconductor industry. A total of 54 CNT probes were studied for tip geometry, and 11 probes were tested on production wafers from a variety of IC manufacturers. Five out of the 11 probes were further evaluated for tip lifetime in semiconductor manufacturing environments. Statistical measurement data and tip shape characterization results provide insights on the applications of CNT probes in microlithography process control. The recent advancements in AFM scan algorithms that enable the control and use of CNT probes were also discussed in this paper. Sidewall measurement data using tilted CNT probes, and the AFM image of a CNT probe showing a comparable resolution to that of transmission electron microscopy (TEM) were presented for the first time. The combination of advanced AFM system and CNT probes has proven to perform challenging metrology in 65 nm node and beyond.
机译：碳纳米管（CNT）作为原子力显微镜（AFM）的探针的研究已在全球进行了十多年的研究；但是，行业在日常操作中尚未广泛接受CNT探针。在这项工作中，我们提出了一系列关于CNT探针在半导体工业中的计量性能的研究。研究了总共54个CNT探针的尖端几何形状，并在来自各种IC制造商的生产晶圆上测试了11个探针。进一步评估了11种探针中的5种在半导体制造环境中的尖端寿命。统计测量数据和尖端形状表征结果提供了有关CNT探针在微光刻工艺控制中的应用的见识。本文还讨论了能够控制和使用CNT探针的AFM扫描算法的最新进展。首次使用倾斜的CNT探针进行侧壁测量数据，并首次显示CNT探针的AFM图像，显示出与透射电子显微镜（TEM）相当的分辨率。事实证明，先进的AFM系统与CNT探针的结合可在65 nm节点及更高的节点上执行具有挑战性的计量。

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