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首页> 外文会议>Optical Measurement Systems for Industrial Inspection V pt.1; Proceedings of SPIE-The International Society for Optical Engineering; vol.6616 pt.1 >Interferometry of thick and thin films
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Interferometry of thick and thin films

机译：厚膜和薄膜的干涉测量

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摘要

Interferometry is now an established technique for the measurement of surface topography. It has the capability of combining sub-nanometre resolution. A very useful extension to its capability is the ability to measure thick and thin films on a local scale. For films with thicknesses in excess of l-2μm (depending on refractive index), the SWLI interaction with the film leads simply the formation of two localised fringes, each corresponding to a surface interface. It is relatively trivial to locate the positions of these two envelope maxima and therefore determine the film thickness, assuming the refractive index is known. For thin films (with thicknesses ～20nm to ～2μm, again depending on the index), the SWLI interaction leads to the formation of a single interference maxima. In this context, it is appropriate to describe the thin film structure in terms of optical admittances; it is this regime that is addressed through the introduction of a new function, the 'helical conjugate field' (HCF) function. This function may be considered as providing a 'signature' of the multilayer measured so that through optimization, the thin film multilayer may be determined on a local scale.
机译：干涉测量法现已成为一种测量表面形貌的成熟技术。它具有结合亚纳米分辨率的能力。对其功能的非常有用的扩展是能够在局部规模上测量厚膜和薄膜。对于厚度超过1-2μm（取决于折射率）的薄膜，SWLI与薄膜的相互作用仅导致形成两个局部条纹，每个条纹对应于一个表面界面。假定折射率是已知的，则定位这两个包络线最大值的位置并因此确定膜厚度是相对琐碎的。对于薄膜（厚度〜20nm〜〜2μm，再次取决于折射率），SWLI相互作用导致形成单个干涉最大值。在这种情况下，以光导纳来描述薄膜结构是适当的；通过引入新功能“螺旋共轭场”（HCF）功能可以解决该问题。该功能可以被认为是提供所测量的多层的“签名”，从而通过优化，可以在局部规模上确定薄膜多层。

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