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首页> 外文会议>Optical Microlithography XIX pt.1 >High-index optical materials for 193-nm immersion lithography
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High-index optical materials for 193-nm immersion lithography

机译：用于193 nm浸没式光刻的高折射率光学材料

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We report on our comprehensive survey of high-index UV optical materials that may enable extension of immersion lithography beyond a numerical aperture of 1.45. Band edge, refractive index, and intrinsic birefringence (IBR) at 193 nm determine basic viability. Our measurements of these properties have reduced the list of potential candidates to: ceramic spinel, lutetium aluminum garnet, and a class of germanium garnets. We discuss our measurements of the intrinsic properties of these materials and assess the present status of their material quality relative to requirements. Ceramic spinel has no significant IBR, but transmission and scatter for the best samples remain at least two orders of magnitude from specifications. Improving these would require a major development effort. Presently available lutetium aluminum garnet has material quality much closer to the specifications. However, the IBR is about three times the required value. The germanium garnets offer the possibility of a lower IBR, but a suitable candidate material has yet to be established.
机译：我们报告了对高折射率紫外线光学材料的全面调查，该调查可能使浸没式光刻技术的数值孔径超过1.45。频带边缘，折射率和193 nm的固有双折射（IBR）决定了基本的生存能力。我们对这些性能的测量将潜在的候选清单减少到：陶瓷尖晶石，铝石榴石和一类锗石榴石。我们讨论了对这些材料的固有特性的测量，并评估了其相对于要求的材料质量的当前状态。陶瓷尖晶石没有明显的IBR，但最佳样品的透射率和散射率至少比规格高出两个数量级。改善这些需要大量的开发工作。当前可用的aluminum铝石榴石的材料质量更接近规格。但是，IBR大约是所需值的三倍。锗石榴石可提供较低的IBR，但尚未确定合适的候选材料。

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