Influence of the pellicle on final photomask flatness

机译：防护膜对最终光掩模平坦度的影响

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Photomask pellicles play an important role in determining final photomask flatness, which is important to photomask optical performance. This study explores the impact of the pellicle frame flatness and pellicle-to-mask adhesive on photomask flatness. In addition, the change in mask flatness as a function of time after pellicle mounting is studied. Implications of these results on photomask manufacture and photolithography are discussed.

机译：光掩模防护膜在确定最终的光掩模平坦度中起重要作用，这对光掩模的光学性能很重要。这项研究探讨了防护膜框架平整度和防护膜-掩模粘合剂对光掩模平坦度的影响。另外，研究了在膜片安装后掩模的平坦度随时间的变化。讨论了这些结果对光掩模制造和光刻的影响。

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来源
《Photomask and Next-Generation Lithography Mask Technology XIII pt.2》|2006年|P.628326.1-628326.7|共7页
会议地点 Yokohama(JP)
作者
Richard Wistrom; Dennis Hayden; Kenneth Racette; Monica Barrett; rew Watts;
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作者单位

IBM Systems Technology Group, 1000 River Street, Essex Junction, VT, USA 05452;

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会议组织
原文格式 PDF
正文语种 eng
中图分类印刷电路;半导体器件制造工艺及设备;
关键词
mask flatness; pellicle; adhesive; frame;

机译：掩模平面度;薄膜;胶粘剂;框架;

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Influence of the pellicle on final photomask flatness

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