A tunable three layer phase mask for single laser exposure 3D photonic crystal generations: bandgap simulation and holographic fabrication

Kris Ohlinger; Yuankun Lin; Hualiang Zhang; Di Xu; Kevin P. Chen

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A tunable three layer phase mask for single laser exposure 3D photonic crystal generations: bandgap simulation and holographic fabrication

机译：适用于单次激光曝光3D光子晶体世代的可调三层相位掩模：带隙模拟和全息制造

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Through the use of a multi-layer phase mask to produce five-beam interference, three-dimensional photonic crystals can be formed through single exposure to a photoresist. In these holographically formed structures, the interconnectivity is controlled by the relative phase difference among contributing beams. Photonic band gaps are calculated and the simulation shows a maximum bandgap of 18% of the middle gap frequency when the phase difference is optimized. A three-layer phase mask is fabricated by placing a spacer layer between two orthogonally-orientated gratings. The phase difference is controlled by thermal-tuning of the spacer thickness. Photonic crystal templates are holographically fabricated in a photosensitive polymer using the phase mask.

机译：通过使用多层相位掩模产生五光束干涉，可以通过单次暴露于光致抗蚀剂来形成三维光子晶体。在这些全息形成的结构中，互连性由贡献光束之间的相对相位差控制。计算了光子带隙，当相位差最优化时，仿真显示最大带隙为中间带隙频率的18％。通过在两个正交取向的光栅之间放置隔离层来制造三层相位掩模。通过间隔物厚度的热调节来控制相位差。使用相掩模在光敏聚合物中全息制造光子晶体模板。

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《Optical Materials Express》 |2011年第5期|共6页
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Kris Ohlinger; Yuankun Lin; Hualiang Zhang; Di Xu; Kevin P. Chen;
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入库时间 2022-08-18 13:19:44

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专利

1. Proposed single-exposure holographic fabrication of microsphere-type photonic crystals through phase-mask techniques [J] . Y. Lin, P. R. Herman, E. L. Abolghasemi Journal of Applied Physics . 2005,第9期

机译：通过相掩膜技术提议的微球型光子晶体的单曝光全息照相制造
2. Nanoimprinting lithography of a two-layer phase mask for three-dimensional photonic structure holographic fabrications via single exposure [J] . Xu D., Chen K.P., Ohlinger K., Nanotechnology . 2011,第3期

机译：用于单次曝光的三维光子结构全息制造的两层相掩模的纳米压印光刻
3. Phase tunable holographic fabrication for three-dimensional photonic crystal templates by using a single optical element [J] . Di Xu, Kevin P. Chen, Ahmad Harb, Applied Physicsletters . 2009,第23期

机译：使用单个光学元件的三维光子晶体模板的相位可调全息制造
4. FABRICATION OF TWO-LAYER INTEGRATED PHASE MASK AND SINGLE-BEAM, SINGLE EXPOSURE FABRICATION OF 3D PHOTONIC CRYSTAL TEMPLATE USING THE MASK [C] . Yuankun Lin, Ahmad Harb, Daniel Rodriguez, International Congress on Applications of Lasers Electro-Optics . 2008

机译：使用掩模的3D光子晶体模板的两层综合相位掩模和单束，单射线曝光制造的制造
5. Laser holographic fabrication of three-dimensional photonic crystal templates using advanced phase mask techniques [D] . Xu, Di 2010

机译：使用先进的相位掩膜技术对三维光子晶体模板进行激光全息制造
6. Flexible Holographic Fabrication of 3D Photonic Crystal Templates with Polarization Control through a 3D Printed Reflective Optical Element [O] . David Lowell, David George, Jeffrey Lutkenhaus, 2010

机译：通过3D打印的反射光学元件进行偏振控制的3D光子晶体模板的灵活全息制作
7. A tunable three layer phase mask for single laser exposure 3D photonic crystal generations: Bandgap simulation and holographic fabrication [O] . Ohlinger K, Zhang H, Lin Y, 2011

机译：用于单次激光曝光3D光子晶体世代的可调三层相位掩模：带隙模拟和全息制造

A tunable three layer phase mask for single laser exposure 3D photonic crystal generations: bandgap simulation and holographic fabrication

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