Novel photocurable epoxy siloxane polymers for photolithography and imprint lithography applications

Pei-I Wang; O. Nalamasu; Rajat Ghoshal; Ram Ghoshal; Charles D. Schaper; Andrew Li; Toh-Ming Lu

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Novel photocurable epoxy siloxane polymers for photolithography and imprint lithography applications

机译：用于光刻和压印光刻应用的新型光固化环氧硅氧烷聚合物

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Polyset epoxy siloxane (PES) polymer is ultraviolet (UV) curable with photoinitiator chemistry based on cationic polymerization. In the present work the authors have investigated the photodefinition characteristics of the epoxy siloxane polymers using photolithography and imprint lithography. The scanning electron microscopic images of the UV-cured patterns exhibit appealing resolution of micrometer scale features for photolithography processes. The imprint lithography has been examined with features smaller than 200 nm. In conjunction with the promising dielectric properties, epoxy siloxane polymers are particularly useful for applications such as the redistribution layer in packaging of integrated circuits.

机译：聚环氧环氧硅氧烷（PES）聚合物可通过基于阳离子聚合的光引发剂化学作用固化为紫外线（UV）。在目前的工作中，作者已经使用光刻和压印光刻技术研究了环氧硅氧烷聚合物的光定义特性。紫外线固化图案的扫描电子显微镜图像显示了用于光刻工艺的微米尺度特征的吸引人的分辨率。压印光刻已被检查具有小于200 nm的特征。结合有希望的介电性能，环氧硅氧烷聚合物特别适用于应用，例如集成电路封装中的再分布层。

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《Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures》 |2008年第1期|p.244-248|共5页
作者
Pei-I Wang; O. Nalamasu; Rajat Ghoshal; Ram Ghoshal; Charles D. Schaper; Andrew Li; Toh-Ming Lu;
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收录信息美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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正文语种 eng
中图分类工程物理学;
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1. Cell-Imprint Surface Modification by Contact Photolithography-Based Approaches: Direct-Cell Photolithography and Optical Soft Lithography Using PDMS Cell Imprints [J] . Kavand Hanie, van Lintel Harald, Sichani Soroush Bakhshi, ACS applied materials & interfaces . 2019,第11期

机译：通过触点基于光刻的方法改变细胞压缩表面改性：使用PDMS细胞印记直接电池光刻和光学软光刻
2. UV nanoimprint lithography of sub-100 nm nanostructures using a novel UV curable epoxy siloxane polymer [J] . Dexian Ye, Pei-I Wang, Zhuqiu Ye, Microelectronic Engineering . 2010,第11期

机译：使用新型UV固化环氧硅氧烷聚合物对100 nm以下纳米结构进行UV纳米压印光刻
3. Facile fabrication of a rigid and chemically resistant micromixer system from photocurable inorganic polymer by static liquid photolithography (SLP) [J] . Qingling Fang, Dong-Pyo Kim, Xiaodong Li Lab on a chip . 2011,第16期

机译：通过静态液体光刻法（SLP）从光固化无机聚合物轻松制造刚性且耐化学腐蚀的微混合器系统
4. Epoxy siloxane polymers for micro and nano fabrication applications [C] . Pei-I Wang, Dexian Ye, Toh-Ming Lu, International Conference and Exhibition on Device Packaging . 2008

机译：用于微型和纳米制造应用的环氧硅氧烷聚合物
5. Imprint lithography and characterization of photosensitive polymers for advanced microelectronics packaging. [D] . Rajarathinam, Venmathy. 2010

机译：用于高级微电子封装的压印光刻和光敏聚合物的表征。
6. Characteristics of Thermosetting Polymer Nanocomposites: Siloxane-Imide-Containing Benzoxazine with Silsesquioxane Epoxy Resins [O] . Chih-Hao Lin, Wen-Bin Chen, Wha-Tzong Whang, 2020

机译：热固性聚合物纳米复合材料的特性：硅氧烷 - 酰亚胺的苯并恶嗪含有Silsesquio烷环氧树脂树脂
7. Lithography: Nanosphere Lithography as a Versatile Method to Generate Surface-Imprinted Polymer Films for Selective Protein Recognition (Adv. Funct. Mater. 37/2013) [O] . Júlia Bognár, Júlia Szűcs, Zsanett Dorkó, 2013

机译：光刻：纳米光刻作为一种多功能的方法，用于产生表面积压缩聚合物薄膜，用于选择性蛋白质识别（ADV。Funct。Matter。37/2013）
8. Development of siloxane-containing epoxy polymers for electrical circuit embedment applications [R] . Patterson, W. J. 1968

机译：开发用于电路嵌入应用的含硅氧烷的环氧聚合物

Novel photocurable epoxy siloxane polymers for photolithography and imprint lithography applications

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