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Intense violet photoluminescence at room temperature in as-deposited a-Si : H : O films

机译:室温沉积的a-Si:H:O薄膜中的强烈紫色光致发光

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摘要

Three photoluminescence (PL) bands at similar to 355, similar to 415, and 740 nm were observed at room temperature in a-Si:H:O films fabricated by plasma-enhanced chemical vapor deposition without post-processing, The violet emission is intense and stable, and its intensity is closely related to the oxygen content in the films, which can be controlled by the applied de bias on the sample substrates during deposition. The first two PL peaks are ascribed to oxygen-related color centers, and the last one to the quantum size effect of the crystallites embedded in a-Si:H:O matrix. (C) 1998 Elsevier Science B.V. All rights reserved. [References: 18]
机译:在室温下通过等离子增强化学气相沉积法制备的a-Si:H:O薄膜在没有后处理的情况下在室温下观察到三个类似于355,类似于415和740 nm的光致发光(PL)带,紫光发射很强它的稳定性与稳定性有关,其强度与薄膜中的氧含量密切相关,可以通过在沉积过程中在样品基材上施加的偏压来控制氧含量。前两个PL峰归因于与氧有关的色心,最后一个归因于a-Si:H:O基质中嵌入的微晶的量子尺寸效应。 (C)1998 Elsevier Science B.V.保留所有权利。 [参考:18]

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