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Controlling the electrical property of highly transparent conducting film of Zn coated Al doped ZnO by mechano-chemical pathway of face-to-face annealing

机译:通过面对面退火的机械化学途径控制Zn包覆Al掺杂ZnO的高透明导电膜的电性能

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摘要

We present a mechano-chemical technique to obtain highly transparent and conducting Al doped ZnO (AZO) film by annealing two Zn coated AZO films in a face-to-face condition in Ar. This transparent conducting oxide (TCO) layer shows a carrier concentration of 2.29 × 10 ~(21) cm ~(-3), mobility of 24.11 cm ~2/Vs and resistivity of ~10 ~(-4) cm for 15 nm Zn coated film. The p-Si/AZO heterojunction shows a high rectification ratio of 1.1 × 10 ~3. Under white light illumination, the forward current of the junction is enhanced by ~1 order of magnitude compared to that under dark condition implying its promising photodiode applications.
机译:我们提出了一种机械化学技术,通过在Ar中面对面地退火两个镀锌的AZO膜来获得高透明和导电的Al掺杂的ZnO(AZO)膜。该透明导电氧化物(TCO)层对15 nm Zn的载流子浓度为2.29×10〜(21)cm〜(-3),迁移率为24.11 cm〜2 / Vs,电阻率为〜10〜(-4)cm涂膜。 p-Si / AZO异质结显示出1.1×10〜3的高整流比。在白光照射下,该结的正向电流比在黑暗条件下的正向电流提高了约1个数量级,这表明其有希望的光电二极管应用。

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