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首页> 外文期刊>Nanotechnology >Fabrication of ferroelectric polymer nanostructures on flexible substrates by soft-mold reverse nanoimprint lithography
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Fabrication of ferroelectric polymer nanostructures on flexible substrates by soft-mold reverse nanoimprint lithography

机译：软模反向纳米压印光刻技术在柔性基板上制备铁电聚合物纳米结构

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摘要

Conventional nanoimprint lithography with expensive rigid molds is used to pattern ferroelectric polymer nanostructures on hard substrate for use in, e.g., organic electronics. The main innovation here is the use of inexpensive soft polycarbonate molds derived from recordable DVDs and reverse nanoimprint lithography at low pressure, which is compatible with flexible substrates. This approach was implemented to produce regular stripe arrays with a spacing of 700 nm from vinylidene fluoride co trifluoroethylene ferroelectric copolymer on flexible polyethylene terephthalate substrates. The nanostructures have very stable and switchable piezoelectric response and good crystallinity, and are highly promising for use in organic electronics enhanced or complemented by the unique properties of the ferroelectric polymer, such as bistable polarization, piezoelectric response, pyroelectric response, or electrocaloric function. The soft-mold reverse nanoimprint lithography also leaves little or no residual layer, affording good isolation of the nanostructures. This approach reduces the cost and facilitates large-area, high-throughput production of isolated functional polymer nanostructures on flexible substrates for the increasing application of ferroelectric polymers in flexible electronics.
机译：具有昂贵的刚性模具的常规纳米压印光刻技术用于在硬质基底上构图铁电聚合物纳米结构，以用于例如有机电子产品。这里的主要创新是使用廉价的软聚碳酸酯模具，该模具由可记录DVD和低压下的反向纳米压印光刻技术制成，可与柔性基板兼容。实施该方法以在柔性聚对苯二甲酸乙二酯基底上从偏二氟乙烯共三氟乙烯铁电共聚物生产间距为700 nm的规则条纹阵列。纳米结构具有非常稳定且可切换的压电响应和良好的结晶度，并且非常有希望用于铁电聚合物的独特特性（例如双稳态极化，压电响应，热电响应或电热功能）增强或补充的有机电子产品中。软模反向纳米压印光刻技术也几乎没有或没有残留层，从而提供了良好的纳米结构隔离。这种方法降低了成本，并促进了在柔性基板上大面积，高通量地生产隔离的功能聚合物纳米结构，从而将铁电聚合物在柔性电子产品中的应用日益广泛。

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