首页> 外文会议>Electrochemical Society Meeting and International Symposium on ULSI Process Integration III; 20030428-20030502; Paris; FR >PARTIALLY DEPLETED SOI DYNAMIC THRESHOLD MOSFET FOR LOW-VOLTAGE AND MICROWAVE APPLICATIONS
【24h】

PARTIALLY DEPLETED SOI DYNAMIC THRESHOLD MOSFET FOR LOW-VOLTAGE AND MICROWAVE APPLICATIONS

机译:用于低电压和微波应用的部分耗尽SOI动态阈值MOSFET

获取原文
获取原文并翻译 | 示例

摘要

In this paper, the performances of a SOI Dynamic Threshold MOSFET (DTMOS) are presented for both low and high frequency and are compared with conventional MOSFET. For the first time, a difference between the DC and RF transconductance of a silicon-based device has been observed. Preliminary explanations of this phenomenon are proposed.
机译:本文介绍了SOI动态阈值MOSFET(DTMOS)在低频和高频下的性能,并与常规MOSFET进行了比较。首次观察到硅基器件的直流和射频跨导之间的差异。提出了对此现象的初步解释。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号